Measurement techniques of radicals, their gas phase and surface reactions in reactive plasma processing
Measurement techniques of radicals, their gas phase and surface reactions in reactive plasma processing
复制标题
反应等离子体处理中自由基、气相和表面反应的测量技术
DOI：
10.1016/s0169-4332(02)00024-7
复制
发表时间：
2002
影响因子：
6.7
通讯作者：
T. Goto
中科院分区：
文献类型：
--
作者：
M. Hori;T. Goto
为了实现材料加工的高性能，人们开发了多种测量反应等离子体中自由基密度的方法，并且最近阐明了过去无法测量的气相中重要自由基的行为。通过这些测量技术，强烈要求定量地了解自由基的表面反应动力学，从而澄清蚀刻和薄膜沉积的前体，以高精度地控制过程。本文描述了自由基密度测量技术、自由基在气相中和表面上的行为的发现。
In order to realize the high performance of material process, various measurement methods for radical densities in the reactive plasmas have been developed and the behaviors of important radicals in the gas phase, which have been impossible to measure in the past, have recently been clarified. With these measurement techniques, it is requested strongly that the quantitatively understanding of kinetics of the surface reaction of radicals and hereby clarifying the precursors for etching and thin film deposition for controlling the process with a high accuracy. In this article, the findings of measurement techniques of radical densities, the behaviors of radicals in the gas phase and on the surface have been described.
影响因子：
3.2
作者：
Tada, S;Takashima, S;Sakamoto, Y
通讯作者：
Sakamoto, Y
开发真空紫外吸收光谱技术，采用氮分子微放电空心阴极灯测量等离子体中氮原子的绝对密度
DOI：
--
发表时间：
2001
期刊：
影响因子：
--
作者：
S. Takashima;S. Arai;M. Hori;T. Goto;A. Kono;Masafumi Ito;K. Yoneda
通讯作者：
K. Yoneda