A Self-Aligned 45°-Tilted Two-Axis Scanning Micromirror for Side-View Imaging
A Self-Aligned 45°-Tilted Two-Axis Scanning Micromirror for Side-View Imaging
复制标题
用于侧视成像的自对准 45° 倾斜两轴扫描微镜
DOI：
10.1109/jmems.2016.2562011
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发表时间：
2016
影响因子：
2.7
通讯作者：
Huikai Xie
中科院分区：
文献类型：
--
作者：
C. Duan;Wei Wang;Xiaoyang Zhang;Liang Zhou;A. Pozzi;Huikai Xie
本文介绍了一种在硅光学台上倾斜45°的两轴电热单晶硅微镜。SiOB为倾斜的两轴扫描镜提供机械支撑和电线，以及用于组装其他光学元件（如光纤和GRIN透镜）的对齐沟槽。镜板的预设倾斜是通过一组应力双晶片悬臂梁的弯曲来实现的。连接在弯曲双晶片上的限位器到达并被相邻的硅侧壁阻挡。通过适当选择止动器到硅侧壁的距离和弯曲双晶片的长度，可以精确地控制倾斜角。制作的反射板尺寸为0.72 mm × 0.72 mm，整个MEMS器件的占地面积为2.22 mm × 1.25 mm。在仅5.5 Vdc的情况下，反射镜的最大总光学扫描角在x轴和y轴上均约为40°。这项技术将使一种新型的更紧凑的显微内窥镜光学成像探针能够用于体内早期癌症检测。
This paper presents a two-axis electrothermal single-crystal-silicon micromirror that is tilted 45° out of plane on a silicon optical bench (SiOB). The SiOB provides mechanical support and electrical wiring to the tilted two-axis scanning mirror, as well as aligned trenches for assembling other optical components, such as optical fibers and GRIN lens. The preset tilting of the mirror plate is achieved via the bending of a set of stressed bimorph cantilevers. A stopper connected on the bending bimorphs reaches and is stopped by the adjacent silicon sidewall. The tilt angle can be precisely controlled by properly choosing the distance from the stopper to the silicon sidewall and the flexure bimorph length. The fabricated mirror plate is 0.72 mm × 0.72 mm and the footprint of the entire MEMS device is 2.22 mm × 1.25 mm. The measured maximum total optical scan angle of the mirror is approximately 40° in both x-axis and y-axis at only 5.5 Vdc. This technology will enable a new class of more compact microendoscopic optical imaging probes for in vivo early cancer detection.
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