Ultrastable atomic force microscopy: atomic-scale stability and registration in ambient conditions.

Ultrastable atomic force microscopy: atomic-scale stability and registration in ambient conditions.
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DOI:
10.1021/nl803298q
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发表时间:
2009-04
期刊:
影响因子:
10.8
通讯作者:
Perkins TT
Perkins TT
中科院分区:
材料科学1区
文献类型:
--
作者:
King GM;Carter AR;Churnside AB;Eberle LS;Perkins TT

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Instrumental drift in atomic force microscopy (AFM) remains a critical, largely unaddressed issue that limits tip–sample stability, registration, and the signal-to-noise ratio during imaging. By scattering a laser off the apex of a commercial AFM tip, we locally measured and thereby actively controlled its three-dimensional position above a sample surface to <40 pm (Δf = 0.01–10 Hz) in air at room temperature. With this enhanced stability, we overcame the traditional need to scan rapidly while imaging and achieved a 5-fold increase in the image signal-to-noise ratio. Finally, we demonstrated atomic-scale (~100 pm) tip–sample stability and registration over tens of minutes with a series of AFM images on transparent substrates. The stabilization technique requires low laser power (<1 mW), imparts a minimal perturbation upon the cantilever, and is independent of the tip–sample interaction. This work extends atomic-scale tip–sample control, previously restricted to cryogenic temperatures and ultrahigh vacuum, to a wide range of perturbative operating environments.
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