Surface impact on nanoparticle-based magnetic resonance imaging contrast agents.
Surface impact on nanoparticle-based magnetic resonance imaging contrast agents.
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作者：
Zhang W;Liu L;Chen H;Hu K;Delahunty I;Gao S;Xie J
磁共振成像(MRI)是临床上应用最广泛的诊断工具之一。为了提高成像质量，可以调节局部T1和T2弛豫时间的MRI造影剂通常在MRI扫描之前或期间注射。然而，临床使用的造影剂，包括基于Gd3+的螯合物和氧化铁纳米颗粒(IONPs)，提供的对比度一般。为了解决这一问题，人们已经进行了广泛的研究，以开发具有优越的R1和R2弛豫性能的替代MRI造影剂。纳米技术的快速发展促进了这些努力，纳米技术允许制备不同尺寸、形状、结晶度和组成的磁性纳米颗粒(NPs)。研究表明，表面涂层也可以在很大程度上影响T1和T2的松弛，并可以量身定做，以利于较高的R1或R2。然而，NPs的表面影响却没有得到太多重视。在此，我们综述了基于NP的T1和T2造影剂开发的最新进展，重点是表面影响。
Magnetic resonance imaging (MRI) is one of the most widely used diagnostic tools in the clinic. To improve imaging quality, MRI contrast agents, which can modulate local T1 and T2 relaxation times, are often injected prior to or during MRI scans. However, clinically used contrast agents, including Gd3+-based chelates and iron oxide nanoparticles (IONPs), afford mediocre contrast abilities. To address this issue, there has been extensive research on developing alternative MRI contrast agents with superior r1 and r2 relaxivities. These efforts are facilitated by the fast progress in nanotechnology, which allows for preparation of magnetic nanoparticles (NPs) with varied size, shape, crystallinity, and composition. Studies suggest that surface coatings can also largely affect T1 and T2 relaxations and can be tailored in favor of a high r1 or r2. However, the surface impact of NPs has been less emphasized. Herein, we review recent progress on developing NP-based T1 and T2 contrast agents, with a focus on the surface impact.
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MR成像探针：设计和应用。
DOI：
10.1039/c4dt02958e
发表时间：
2015-03-21
期刊：
Dalton transactions (Cambridge, England : 2003)
影响因子：
--
作者：
Boros E;Gale EM;Caravan P
通讯作者：
Caravan P
影响因子：
4.7
作者：
Bae, Ki Hyun;Kim, Young Beom;Park, Tae Gwan
通讯作者：
Park, Tae Gwan
影响因子：
9.5
作者：
Baek, Myung Ju;Park, Ja Young;Lee, Gang Ho
通讯作者：
Lee, Gang Ho
影响因子：
7
作者：
Carniato, Fabio;Thangavel, Kalaivani;Botta, Mauro
通讯作者：
Botta, Mauro
影响因子：
4.6
作者：
Ahmad MW;Xu W;Kim SJ;Baeck JS;Chang Y;Bae JE;Chae KS;Park JA;Kim TJ;Lee GH
通讯作者：
Lee GH