Oxidation behavior of magnetron sputtered Mo2N/AlN multilayer coatings during heat treatment
Oxidation behavior of magnetron sputtered Mo2N/AlN multilayer coatings during heat treatment
复制标题
磁控溅射Mo2N/AlN多层涂层热处理过程中的氧化行为
DOI：
10.1016/j.ceramint.2015.01.156
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发表时间：
2015-06
影响因子：
5.2
通讯作者：
Jiang, Bailing
中科院分区：
文献类型：
--
作者：
Wang, Tao;Zhang, Guojun;Liu, Zhuanning;Jiang, Bailing
采用直流磁控溅射法制备了AlN层厚度为0.5 ~ 3.7 nm的Mo2N/AlN多层涂层。Mo2N/AlN多层涂层呈现柱状生长结构。当AlN层厚度超过1.2 nm时，AlN层由fcc结构转变为非晶结构，破坏了多层涂层的结晶完整性。采用x射线衍射（XRD）、x射线光电子能谱（XPS）和扫描电子显微镜（SEM）对涂层在空气中分别于400℃、550℃、700℃氧化1h进行了表征。结果表明，随着AlN层厚度的增加，Mo2N/AlN多层涂层的抗氧化性能提高，主要是通过降低柱状晶界密度，在表面形成致密的al2o3氧化层。在Mo2N涂层中添加AlN也使Mo2N/AlN多层涂层的摩擦系数（0.36 ~ 0.42）低于Mo2N涂层的摩擦系数（0.62）。
The Mo2N/AlN multilayer coatings with AlN layer thickness in the range of 0.5 nm to 3.7 nm were deposited by dc magnetron sputtering. The Mo2N/AlN multilayer coatings exhibited columnar growth structure. As the AlN layers’ thickness exceeds 1.2 nm, AlN layers changed from fcc structure to amorphous structure, which breaks off the crystallization integrity of multilayer coatings. The coatings oxidized at 400 °C, 550 °C, 700 °C in air for 1 h were investigated by X-ray diffractions (XRD), X-ray photoelectron spectroscopy (XPS) and Scanning electron microscopy (SEM). It was found that with the increase of AlN layer thickness, the oxidation resistance of Mo2N/AlN multilayer coatings was improved by reducing the density of columnar grain boundaries and forming dense Al2O3oxide layer on the surface. The addition of AlN to Mo2N coatings also leads to the lower coefficient of friction (0.36–0.42) of Mo2N/AlN multilayer coatings than that (0.62) of Mo2N coatings.
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