He Buffer Gas for Moderating the Kinetic Energy of Pulsed Laser Deposition Plumes
He Buffer Gas for Moderating the Kinetic Energy of Pulsed Laser Deposition Plumes
复制标题
用于调节脉冲激光沉积羽流动能的 He 缓冲气体
DOI:
10.1021/acs.cgd.1c00456
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发表时间:
2021
期刊:
影响因子:
--
通讯作者:
Lippmaa Mikk
中科院分区:
文献类型:
--
作者:
Takahashi Ryota;Yamamoto Takahisa;Lippmaa Mikk
We have investigated the effect of helium buffer gas on the moderation of the kinetic energy of pulsed laser deposition (PLD) plumes during the growth of SrTiO3thin films. Atomically smooth SrTiO3thin films were grown by PLD using a neodymium yttrium aluminum garnet (Nd:YAG) laser for target ablation. The lattice parameters of the SrTiO3thin films were found to be different from the cubic bulk value due to the presence of crystal defects, leading to the formation of a tetragonally distorted structure. One of the reasons for the presence of defects was found to be the high kinetic energy of the ablation plumes generated by the Nd:YAG laser operating at high energy densities. The kinetic energy of ionized species in the plume exceeded 100 eV, which means that adatoms arriving on the film surface had sufficient energy to resputter atoms from the surface of the deposited SrTiO3film, creating point defects. A mixed atmosphere of He and O2was used to moderate the plume kinetic energy without reducing the deposition rate. A nearly 10-fold reduction of the kinetic energy was obtained at a total pressure of 0.6 Torr, while the O2pressure was kept at 10–5Torr. Minimizing the plume kinetic energy and the associated film surface resputtering improved the crystallinity of SrTiO3thin films. The helium gas pressure was found to be an important process parameter for tuning the functional properties of oxide films. We demonstrate the He moderator effect on two characteristics of SrTiO3films, the appearance of a polar state and water permeability, both of which are sensitive to the presence of structural defects.
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DOI:
10.1080/23746149.2018.1523686
发表时间:
2018-10
期刊:
Advances in Physics: X
影响因子:
--
作者:
Hai-Tian Zhang;Zhen Zhang;Hua Zhou;Hidekazu Tanaka;D. Fong;S. Ramanathan
通讯作者:
Hai-Tian Zhang;Zhen Zhang;Hua Zhou;Hidekazu Tanaka;D. Fong;S. Ramanathan
DOI:
--
发表时间:
2014
期刊:
影响因子:
--
作者:
Ryota Takahashi;Isao Ohkubo;Miho Kitamura;Masaharu Oshima;Yasuo Cho;Mikk Lippmaa
通讯作者:
Mikk Lippmaa
影响因子:
3.3
作者:
M. Moll;M. Schlanges;T. Bornath;V. Krainov
通讯作者:
V. Krainov
影响因子:
4.6
作者:
Hensling FVE;Keeble DJ;Zhu J;Brose S;Xu C;Gunkel F;Danylyuk S;Nonnenmann SS;Egger W;Dittmann R
通讯作者:
Dittmann R
影响因子:
4
作者:
Jalan, Bharat;Moetakef, Pouya;Stemmer, Susanne
通讯作者:
Stemmer, Susanne