Comparison of Camera Calibration and Measurement Accuracy Techniques for Phase Measuring Deflectometry
Comparison of Camera Calibration and Measurement Accuracy Techniques for Phase Measuring Deflectometry
复制标题
相位测量偏转相机标定和测量精度技术的比较
DOI：
10.3390/app112110300
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发表时间：
2021-11
期刊：
影响因子：
--
通讯作者：
Wuxiang Zhao
中科院分区：
文献类型：
--
作者：
Renhao Ge;Dahai Li;Xinwei Zhang;Ruiyang Wang;Wanxing Zheng;Xiaowei Li;Wuxiang Zhao
相位测量偏折术（PMD）是一种具有竞争力的镜面测量方法，具有高动态范围、非接触过程和全场测量的优点，而且还可以实现高精度。摄像机标定是偏振模色散测量的关键步骤。为此，本文提出了一种基于入射光瞳中心标定的方法。然后，我们提出的方法进行了比较，最流行的摄影测量方法的基础上张的技术（PM）和黄的模态相位测量偏折术（MPMD）。本文介绍了这三种方法的标定过程，并利用光线追迹法分析了PMD系统中自由度摄动引起的测量误差。在实验中，分别对平面窗玻璃和平面光学元件进行了测量，并对三种方法的测量结果进行了比较。对平面光学元件（去除Zernike多项式的前6项）的实验结果表明，该方法的测量精度达到了13.71 nm RMS和80.50 nm PV，与干涉仪的测量精度相当。
Phase measuring deflectometry (PMD) is a competitive method for specular surface measurement that offers the advantages of a high dynamic range, non-contact process, and full field measurement; furthermore, it can also achieve high accuracy. Camera calibration is a crucial step for PMD. As a result, a method based on the calibration of the entrance pupil center is introduced in this paper. Then, our proposed approach is compared with the most popular photogrammetric method based on Zhang’s technique (PM) and Huang’s modal phase measuring deflectometry (MPMD). The calibration procedures of these three methods are described, and the measurement errors introduced by the perturbations of degrees of freedom in the PMD system are analyzed using a ray tracing technique. In the experiment, a planar window glass and an optical planar element are separately measured, and the measurement results of the use of the three methods are compared. The experimental results for the optical planar element (removing the first 6 terms of the Zernike polynomial) show that our method’s measurement accuracy reached 13.71 nm RMS and 80.50 nm PV, which is comparable to accuracy values for the interferometer.
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影响因子：
1.3
作者：
P. Su;M. Khreishi;T. Su;R. Huang;M. Dominguez;A. Maldonado;G. Butel;Yuhao Wang;Robert E. Parks;J. Burge
通讯作者：
P. Su;M. Khreishi;T. Su;R. Huang;M. Dominguez;A. Maldonado;G. Butel;Yuhao Wang;Robert E. Parks;J. Burge
影响因子：
--
作者：
Yanli Hou;X. Su;Wenjing Chen
通讯作者：
Yanli Hou;X. Su;Wenjing Chen
影响因子：
19.5
作者：
Gennery, Donald B.
通讯作者：
Gennery, Donald B.
DOI：
10.1117/12.2024500
发表时间：
2013-09
期刊：
--
影响因子：
--
作者：
R. Huang;P. Su;J. Burge;M. Idir
通讯作者：
R. Huang;P. Su;J. Burge;M. Idir
DOI：
--
发表时间：
2001
期刊：
--
影响因子：
--
作者：
J. Bouguet
通讯作者：
J. Bouguet