pH dependent passivation behavior of niobium in acid fluoride-containing solutions
pH dependent passivation behavior of niobium in acid fluoride-containing solutions
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含氟溶液中铌的 pH 依赖性钝化行为
DOI：
10.1016/j.electacta.2018.07.221
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发表时间：
2018-09
影响因子：
6.6
通讯作者：
Zhang Lai Chang
中科院分区：
文献类型：
--
作者：
Guan Lei;Li Yu;Wang Guan;Zhang Yongkang;Zhang Lai Chang
本文研究了铌在pH为4、5和6的酸性氟化物溶液中的钝化行为。采用电化学测试和表面表征方法系统研究了pH值对Nb在腐蚀性口腔环境中电化学稳定性的影响。采用点缺陷模型（PDM）和表面电荷模型（SCA）分析了钝化膜的生长和溶解动力学。随着pH值降低，钝化膜变得更具反应性并且遭受更严重的溶解，导致钝化膜上的更高的点缺陷密度和膜/溶液界面处更显著的表面电荷行为。酸性越强，低氧化物含量越少，表面越粗糙，钝化膜越薄。由于高的电化学稳定性的钝化膜是所需的Nb植入物，从这项工作的结果揭示了使用含氟预防物质。
In this work, the passivation behavior of Nb in acid fluoride-containing solutions with pH of 4, 5 and 6 was investigated. Both electrochemical measurements and surface characterization were systematically used to explore the pH effect on the electrochemical stability of Nb in aggressive oral cavity environment. The point defect model (PDM) and surface charge approach (SCA) were used as theoretical basis to analyze the passive film growth and dissolution kinetics. As the pH value decreases, the passive film becomes more reactive and suffers more severe dissolution, leading to higher point defect density across the passive film and more pronounced surface charge behavior at the film/solution interface. Furthermore, the surface becomes rougher and the passive film is thinner with less amount of suboxide as the solution is more acid. Since high electrochemical stability of the passive films is desirable for Nb implants, the results from this work shed insight into the use of fluoride-containing prophylactic substances.
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影响因子：
6.6
作者：
Ying Li;Tao Zhang;Fu-hui Wang
通讯作者：
Ying Li;Tao Zhang;Fu-hui Wang
影响因子：
6.6
作者：
E. Sikora;J. Sikora;D. Macdonald
通讯作者：
E. Sikora;J. Sikora;D. Macdonald
DOI：
10.1002/j.0022-0337.2007.71.3.tb04289.x
发表时间：
2006
影响因子：
3.9
作者：
通讯作者：
--
DOI：
10.1021/la9036869
发表时间：
2010-01
期刊：
Langmuir : the ACS journal of surfaces and colloids
影响因子：
--
作者：
Desheng Kong
通讯作者：
Desheng Kong
影响因子：
2
作者：
ten Cate, JM
通讯作者：
ten Cate, JM