Organic matrix effects in inductively coupled plasma mass spectrometry: A tutorial review
Organic matrix effects in inductively coupled plasma mass spectrometry: A tutorial review
复制标题
电感耦合等离子体质谱中的有机基质效应：教程回顾
DOI：
10.1080/05704928.2021.1897991
复制
发表时间：
2021-03
影响因子：
6.1
通讯作者：
Guoli Yuan
中科院分区：
文献类型：
--
作者：
Shenghua Liu;Zhantao Han;Xiangke Kong;Jing Zhang;Zhe Lv;Guoli Yuan
电感耦合等离子体质谱（ICP-MS）已发展成为多元素或同位素分析的准确和灵敏的技术。在许多情况下，优选将有机化合物或含碳水溶液引入ICP-MS。然而，由于其复杂的基质效应和潜在的作用机制，目前还存在许多局限性。本文对ICP-MS中有机溶剂的基体效应进行了综述，通过查阅大量文献，总结了有机溶剂对ICP-MS光谱干扰和非光谱干扰的影响。随后，讨论了影响有机等离子体性能的主要因素。最后，着重阐明了ICP-MS各阶段中有机化合物引起的基本变化的潜在机制。
Inductively coupled plasma mass spectrometry (ICP-MS) has been developed into an accurate and sensitive technique for multi-elemental or isotopic analysis. There are many circumstances in which the introduction of an organic compound or aqueous solutions containing carbon to the ICP-MS may be preferred. However, it is still confined by its complexity matrix effects and its potential mechanisms. The present review is dedicated to dealing with the organic solvent matrix effects in ICP-MS. With a thorough bibliographic study, the influences of organic compounds on the spectral and non-spectral interferences in ICP-MS are summarized. Subsequently, the main factors for the performance of organic plasma are discussed. Finally, great attention is paid to clarify the potential mechanisms to understand the fundamental changes originated from organic compounds in each stage of ICP-MS.
登录
查看更多内容
影响因子：
3.4
作者：
M. Campbell;C. Demesmay;M. Ollé
通讯作者：
M. Campbell;C. Demesmay;M. Ollé
影响因子：
3.4
作者：
L. Tormen;E. Chaves;T. Saint’Pierre;V. L. A. Frescura;A. J. Curtius
通讯作者：
L. Tormen;E. Chaves;T. Saint’Pierre;V. L. A. Frescura;A. J. Curtius
影响因子：
3.5
作者：
L. Ebdon;M. Ford;R. Hutton;S. Hill
通讯作者：
L. Ebdon;M. Ford;R. Hutton;S. Hill
影响因子：
6.2
作者：
J. Goossens;F. Vanhaecke;L. Moens;R. Dams
通讯作者：
J. Goossens;F. Vanhaecke;L. Moens;R. Dams
影响因子：
4.8
作者：
Wei Guo;Shenghong Hu;Yan-Xing Wang;Luyuan Zhang;Zhaochu Hu;Jiangyi Zhang
通讯作者：
Wei Guo;Shenghong Hu;Yan-Xing Wang;Luyuan Zhang;Zhaochu Hu;Jiangyi Zhang