Topological transport and atomic tunnelling-clustering dynamics for aged Cu-doped Bi2Te3 crystals.
Topological transport and atomic tunnelling-clustering dynamics for aged Cu-doped Bi2Te3 crystals.
复制标题
DOI:
10.1038/ncomms6022
复制
发表时间:
2014-09-23
影响因子:
16.6
通讯作者:
Wang, Guanghou
中科院分区:
文献类型:
--
作者:
Chen, Taishi;Chen, Qian;Schouteden, Koen;Huang, Wenkai;Wang, Xuefeng;Li, Zhe;Miao, Feng;Wang, Xinran;Li, Zhaoguo;Zhao, Bo;Li, Shaochun;Song, Fengqi;Wang, Jinlan;Wang, Baigeng;Van Haesendonck, Chris;Wang, Guanghou
Enhancing the transport contribution of surface states in topological insulators is vital if they are to be incorporated into practical devices. Such efforts have been limited by the defect behaviour of Bi2Te3 (Se3) topological materials, where the subtle bulk carrier from intrinsic defects is dominant over the surface electrons. Compensating such defect carriers is unexpectedly achieved in (Cu0.1Bi0.9)2Te3.06 crystals. Here we report the suppression of the bulk conductance of the material by four orders of magnitude by intense ageing. The weak antilocalization analysis, Shubnikov–de Haas oscillations and scanning tunnelling spectroscopy corroborate the transport of the topological surface states. Scanning tunnelling microscopy reveals that Cu atoms are initially inside the quintuple layers and migrate to the layer gaps to form Cu clusters during the ageing. In combination with first-principles calculations, an atomic tunnelling–clustering picture across a diffusion barrier of 0.57 eV is proposed. Enhancing the transport properties of surface states in topological insulators is vital if they are to be incorporated into practical devices. Towards this end, Chen et al. study the transport in aged (Cu0.1Bi0.9)2Te3.06, where the ageing process suppresses bulk conductance by up to four orders of magnitude.
登录
查看更多内容
影响因子:
8.6
作者:
He, X.;Zhou, W.;Yarmoff, J. A.
通讯作者:
Yarmoff, J. A.
影响因子:
8.6
作者:
Brahlek, Matthew;Koirala, Nikesh;Oh, Seongshik
通讯作者:
Oh, Seongshik
影响因子:
8.6
作者:
Chen, J.;Qin, H. J.;Lu, L.
通讯作者:
Lu, L.
影响因子:
3.2
作者:
Aguilar, R. Valdes;Wu, L.;Armitage, N. P.
通讯作者:
Armitage, N. P.
影响因子:
8.6
作者:
Hor, Y. S.;Williams, A. J.;Cava, R. J.
通讯作者:
Cava, R. J.