Raman Spectrum of Epitaxial Graphene on SiC (0001) by Pulsed Electron Irradiation
Raman Spectrum of Epitaxial Graphene on SiC (0001) by Pulsed Electron Irradiation
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脉冲电子辐照在 SiC (0001) 上外延石墨烯的拉曼光谱
DOI:
10.1088/0256-307x/27/4/046803
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发表时间:
2010-04
影响因子:
3.5
通讯作者:
Chen Xiao-Long
中科院分区:
文献类型:
--
作者:
Huang Qing-Song;Guo Li-Wei;Wang Wen-Jun;Wang Gang;Wang Wan-Yan;Jia Yu-Ping;Lin Jing-Jing;Li Kang;Chen Xiao-Long
We report new Raman features of epitaxial graphene (EG) on Si-face 4H-SiC prepared by pulsed electron irradiation (PEI). With increasing graphene layers, frequencies of G and 2D peaks show blue-shifts and approach those of bulk highly-oriented pyrolytic graphite. It is indicated that the EG is slightly tension strained and tends to be strain-free. Meanwhile, single Lorentzian line shapes are well fitted to the 2D peaks of EG on SiC(0001) and their full widths at half maximum decrease with the increasing graphene layers, which indicates that the multilayer EG on Si-face can also contain turbostratic stacking by our PEI route instead of only AB Bernal stacking by a traditional thermal annealing method. It is worth noting that the stacking style plays an important role on the charge carrier mobility. Therefore our findings will be a candidate for growing quality graphene with high carrier mobility both on the Si- and C-terminated SiC substrate. Mechanisms behind the features are studied and discussed.
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影响因子:
38.3
作者:
Das, A.;Pisana, S.;Sood, A. K.
通讯作者:
Sood, A. K.
影响因子:
3.7
作者:
Emtsev, K. V.;Speck, F.;Riley, J. D.
通讯作者:
Riley, J. D.
影响因子:
3.7
作者:
Latil, Sylvain;Meunier, Vincent;Henrard, Luc
通讯作者:
Henrard, Luc
影响因子:
4
作者:
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通讯作者:
Berger, C.
影响因子:
41.2
作者:
Geim, A. K.;Novoselov, K. S.
通讯作者:
Novoselov, K. S.