Ion energy distributions and efficiency of sputtering process in HIPIMS system
Ion energy distributions and efficiency of sputtering process in HIPIMS system
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HIPIMS系统中溅射过程的离子能量分布和效率
DOI：
10.1088/0022-3727/41/11/115306
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发表时间：
2008
期刊：
影响因子：
--
通讯作者：
Burcalova K
中科院分区：
文献类型：
--
作者：
Burcalova K
研究了高功率脉冲磁控溅射沉积金属薄膜的工艺。进行时间平均质谱分析，以提供关于单个离子的能量分布和在宽范围的沉积条件下的总离子通量的组成的信息。使用铬和铌靶，重复频率分别为50 Hz和60 Hz，氩气压力为0.29 Pa和2.7 Pa。结果表明，工作气压对离子能量分布有很强的影响。对于低压（0.29 Pa）的金属离子的能量分布揭示了一个显着的高能量的尾巴（高达20 eV）。结果还表明，平均脉冲电流的增加导致总离子通量中金属离子的比例更高。氩离子占主导地位的铌离子，而铬离子成为占主导地位的总离子通量在基板上的目标功率负载的高值。在高压（2.7Pa）下，金属离子能量分布的高能尾变得可以忽略不计。薄膜沉积实验表明，溅射过程的效率和粒子传输到基板的目标功率负载的增加而下降。
High-power impulse magnetron sputter deposition of metallic films was investigated. Time-averaged mass spectroscopy was performed to provide information on the energy distribution of individual ions and the composition of total ion fluxes over a wide range of deposition conditions. Chromium and niobium targets were used, the repetition frequency was 50 Hz and 60 Hz, respectively, and argon pressures were 0.29 Pa and 2.7 Pa. The strong effect of the working gas pressure on the ion energy distribution was shown. For low pressure (0.29 Pa) the metal ion energy distribution reveals a significant high energy tail (up to 20 eV). It was also shown that the increase in the average pulse current results in a higher fraction of metal ions in the total ion flux. Argon ions were dominant over niobium ions, while chromium ions became dominant in the total ion flux onto the substrate at high values of target power loading. At a high pressure (2.7 Pa), the high energy tail of metal ion energy distribution became negligible. Film deposition experiments showed that the efficiency of the sputtering process and particle transport to the substrate decreased with increasing target power loading.
反应磁控溅射过程中等离子体的能量分辨离子质谱
影响因子：
5.4
作者：
M. Mišina;L. Shaginyan;M. Macek;P. Panjan
通讯作者：
P. Panjan
磁控溅射放电中溅射原子和反射原子热化的蒙特卡罗模拟
DOI：
10.1116/1.579874
发表时间：
1995
期刊：
Journal of Vacuum Science and Technology
影响因子：
--
作者：
Y. Yamamura;M. Ishida
通讯作者：
M. Ishida
用能量分辨质谱测量不平衡磁控管等离子体中离子的能量分布
影响因子：
5.4
作者：
S. Kadlec;C. Quaeyhaegens;G. Knuyt;L. Stals
通讯作者：
L. Stals