Self-lubricating CrAlN/VN multilayer coatings at room temperature
Self-lubricating CrAlN/VN multilayer coatings at room temperature
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室温自润滑 CrAlN/VN 多层涂层
DOI：
10.1016/j.apsusc.2013.04.068
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发表时间：
2013-08
影响因子：
6.7
通讯作者：
Dongliang Zhao
中科院分区：
文献类型：
--
作者：
Jyh-Wei Lee;Bo Li;Yuxi Wang;Dongliang Zhao
氮化钒(VN)在应力作用下容易氧化成钒氧化物，并变得有色。CrAlN是一种硬质材料，因此CrAlN/VN多层膜在软金属的干式加工中具有良好的硬度和润滑性。研究了多层膜对涂层常温力学性能和摩擦学性能的影响。在同轴磁控溅射系统中，在硬质合金碳化钨和硅片(100)衬底上沉积了CrAlN/VN多层膜。一个周期包含一个CrAlN层加上一个相邻的VN层。周期厚度大致从3 nm到30 nm不等，周期总数从30到300个不等。采用X射线衍射仪、扫描电子显微镜、透射电子显微镜、X射线光电子能谱和电子探针对薄膜的微观结构和化学成分进行了表征。在力学和摩擦学研究中使用了纳米压痕和球盘磨损试验。CrAlN/VN多层膜具有良好的润滑性能，最低摩擦系数为0.26。当周期厚度为20 nm时，多层膜的力学性能最好(硬度为32.4 Gpa，弹性模数为375 Gpa，最小磨损率为1.1×10−7mm~3/Nm)。
Vanadium nitride (VN) is easily oxidized to form vanadium oxides and becomes lubricious under stress. CrAlN is hard thus CrAlN/VN multilayer coatings render both hardness and lubricious properties attractive in dry machining of soft metals. This study investigates the effect of multi-layering on the coating's mechanical and tribological properties at room temperature. The CrAlN/VN multilayer coatings are deposited on cemented tungsten carbide and Si wafer (100) substrates in an in-line magnetron sputtering system. A period contains one layer of CrAlN plus one adjacent layer of VN. The period thickness varies roughly from 3nm to 30nm; the total number of the periods varies from 30 to 300. X-ray diffractometry, scanning electron microscopy, transmission electron microscopy, X-ray photoelectron spectroscopy and electron probe micro-analyzer are employed to characterize the microstructures and chemistry. Nanoindentation and ball-on-disk wear test are used in mechanical and tribological studies. The CrAlN/VN multilayer coatings have good lubricant property with lowest coefficient of friction of 0.26. At the period thickness of 20nm, the multilayer coatings obtained the best mechanical properties (hardness of 32.4GPa, elastic modulus of 375GPa, minimum wear rate of 1.1×10−7mm3/Nm).
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影响因子：
2.1
作者：
X. Ding;A. Tan;Xianting Zeng;C. Wang;T. Yue;Chang Q. Sun
通讯作者：
X. Ding;A. Tan;Xianting Zeng;C. Wang;T. Yue;Chang Q. Sun
影响因子：
2.1
作者：
R. Franz;J. Neidhardt;B. Sartory;R. Tessadri;C. Mitterer
通讯作者：
R. Franz;J. Neidhardt;B. Sartory;R. Tessadri;C. Mitterer
影响因子：
5.4
作者：
Franz, R.;Neidhardt, J.;Mitterer, C.
通讯作者：
Mitterer, C.
影响因子：
5.4
作者：
Uchida, M;Nihira, N;Aizawa, T
通讯作者：
Aizawa, T
影响因子：
5.4
作者：
Chia-Lin Li;Fanjing Wu;Jyh-Wei Lee;Y. Tsai;Li-Chun Chang
通讯作者：
Chia-Lin Li;Fanjing Wu;Jyh-Wei Lee;Y. Tsai;Li-Chun Chang