Studies on structure and Raman spectroscopy of Ni-doped copper phthalocyanine thin films
Studies on structure and Raman spectroscopy of Ni-doped copper phthalocyanine thin films
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Ni掺杂铜酞菁薄膜的结构及拉曼光谱研究
DOI：
10.1016/j.apsusc.2014.01.122
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发表时间：
2014-04
影响因子：
6.7
通讯作者：
Cao, ChongDe
中科院分区：
文献类型：
--
作者：
Zheng, JianBang;Qiao, Kai;Qu, JunRong;Cao, ChongDe
在高真空室中制备了不同掺镍比的铜酞菁(CuPc)有机薄膜。原子力显微镜、X射线衍射仪、紫外可见光谱和拉曼光谱的结果表明，随着镍掺杂比例的增加，薄膜的表面形貌变得更加平坦，薄膜的结构保持了原有的α相结构，只是结晶度和微晶尺寸发生了变化，多功能性结构和电荷输运发生了改变。此外，通过对比和密度泛函理论(DFT)计算，分析了514 nm可见光激发的正常拉曼光谱(NRS)、325 nm紫外激发的共振拉曼光谱(RR)和633 nm激发的共振拉曼光谱(RR)，证实了CuPc分子与镍原子之间没有化学变化；非晶态镍原子团簇具有明显的光吸收损失，为我们对不同浓度的Ni掺杂的CuPc薄膜的拉曼效应有了深刻的结构理解。
Ni-doped copper phthalocyanine (CuPc) organic films with different mixing ratios were prepared in high vacuum (HV) chamber. The results of AFM, XRD, UV–vis and Raman spectroscopy indicated that the surface morphologies of the films were found to be flater and the structures of the CuPc films still kept their original α-phase crystal, with only the crystallinity or crystallite sizes being changed and the versatile structure or charge transport being modified with the increase of Ni-doping ratios. Moreover, 514 nm-visible-light-excited normal Raman spectra (NRS), 325 nm-ultraviolet-excited and 633 nm-excited resonance Raman spectra (RRS) were analyzed by comparison and by density functional theory (DFT) calculations of the amorphous nickel atoms clusters, confirming that there were no chemical changes between CuPc molecules and nickel atoms; and the amorphous nickel atoms clusters had a noticeable light absorption loss, offering us an insightful structural understanding of the Raman effect of the different concentrations of Ni-doped CuPc films.
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影响因子：
3.5
作者：
Dzhagan, V. M.;Valakh, M. Ya;Zahn, D. R. T.
通讯作者：
Zahn, D. R. T.
影响因子：
2.1
作者：
T. Sasabayashi;N. Ito;E. Nishimura;M. Kon;P. Song;K. Utsumi;A. Kaijo;Y. Shigesato
通讯作者：
T. Sasabayashi;N. Ito;E. Nishimura;M. Kon;P. Song;K. Utsumi;A. Kaijo;Y. Shigesato
DOI：
--
发表时间：
2008
期刊：
Journal of Physics D
影响因子：
--
作者：
F. ChadwickSJ;E. VirdenA;Haehnel;D. DutsonJ;K. Matsumoto;T. Yoshida;T. Sawano;T. Goto;
通讯作者：
F. ChadwickSJ;E. VirdenA;Haehnel;D. DutsonJ;K. Matsumoto;T. Yoshida;T. Sawano;T. Goto;
影响因子：
8.4
作者：
Acikbas, Yaser;Evyapan, Murat;Bekaroglu, Ozer
通讯作者：
Bekaroglu, Ozer
DOI：
10.1088/0022-3727/41/18/185104
发表时间：
2008-09
期刊：
Journal of Physics D: Applied Physics
影响因子：
--
作者：
Pankaj Kumar;H. Kumar;S. Chand;S. Jain;Vikram Kumar;Vinod Kumar;R. Pant;R. Tandon
通讯作者：
Pankaj Kumar;H. Kumar;S. Chand;S. Jain;Vikram Kumar;Vinod Kumar;R. Pant;R. Tandon