Dependence of atomic oxygen resistance and the tribological properties on microstructures of WS2 films
Dependence of atomic oxygen resistance and the tribological properties on microstructures of WS2 films
复制标题
WS2 薄膜的原子氧电阻和摩擦学性能对微观结构的依赖性
DOI:
10.1016/j.apsusc.2014.01.002
复制
发表时间:
2014-04
影响因子:
6.7
通讯作者:
Liu, Weimin
中科院分区:
文献类型:
--
作者:
Wang, Desheng;Zhou, Feng;Weng, Lijun;Liu, Weimin
To study the anti-oxidation mechanism of WS2films, the pure WS2, and Al doped WS2composite films were prepared via radio frequency sputtering and the atomic oxygen (AO) irradiation tests were conducted using a ground AO simulation facility. The tribological properties of both films before and after AO irradiation were evaluated using vacuum ball-on-disk tribo-tester. The incorporation of a small fraction of Al dopant resulted in microstructure change from loose columnar platelet with significant porosity for pure WS2film to very dense structure. In pure WS2film, WS2exists as crystalline phase with edge-plane preferential orientation, but nanocrystalline and amorphous phase coexists for the WS2-Al composite film. Even if large amount of AO transported into the interior through the longitudinal pores, the pure film showed good AO irradiation resistance owing to the basal plane of WS2crystal exhibiting much higher anti-oxidation capacity than the edge-plane. The composite film also had excellent AO irradiation resistance due to the formation of effective thinner WO3cladding layer in the sub-surface layer. Tribological results revealed that the composite films showed a significantly improved wear resistance, in comparison to the pure WS2film. Besides, due to the effective AO resistance, the tribological properties of WS2films remained almost unchanged before and after AO irradiation.
登录
查看更多内容
影响因子:
2.1
作者:
J. Zabinski;M. Donley;S. Walck;T. Schneider;N. T. McDevitt
通讯作者:
J. Zabinski;M. Donley;S. Walck;T. Schneider;N. T. McDevitt
影响因子:
6.7
作者:
Shusheng Xu;Xiaoming Gao;M. Hu;Jiayi Sun;D. Jiang;Feng Zhou;Wei-min Liu;L. Weng
通讯作者:
Shusheng Xu;Xiaoming Gao;M. Hu;Jiayi Sun;D. Jiang;Feng Zhou;Wei-min Liu;L. Weng
影响因子:
2.1
作者:
Deyang Yu;Jun-an Wang;J. Yang
通讯作者:
Deyang Yu;Jun-an Wang;J. Yang
影响因子:
3.2
作者:
M. Tagawa;M. Muromoto;S. Hachiue-;K. Yokota;N. Ohmae;K. Matsumoto;M. Suzuki
通讯作者:
M. Tagawa;M. Muromoto;S. Hachiue-;K. Yokota;N. Ohmae;K. Matsumoto;M. Suzuki
影响因子:
5.4
作者:
Sun-Mi Kim;Jinsub Choi
通讯作者:
Sun-Mi Kim;Jinsub Choi