Comparison of thermal management techniques for semiconductor disk lasers
Comparison of thermal management techniques for semiconductor disk lasers
复制标题
半导体盘式激光器热管理技术比较
DOI:
10.1117/12.761616
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发表时间:
2008
期刊:
影响因子:
--
通讯作者:
Giet S
中科院分区:
文献类型:
--
作者:
Giet S
Semiconductor Disk Lasers (SDLs) are compact lasers suitable for watt to multi-watt direct generation in the 670- 2350nm waveband and frequency-doubled operation in the ultraviolet and visible regions. This is, however, critically dependent on the thermal management strategy used as, in this type of laser, the pump is absorbed over micrometer lengths and the gain and loss are temperature sensitive. In this paper, we compare the two heat dissipation techniques that have been successfully deployed to-date: the "thin device" approach where the semiconductor active mirror is bonded onto a heatsink and its substrate subsequently removed, and the "heatspreader" technique where a high thermal conductivity platelet is directly bonded onto the active part of the unprocessed epilayer. We show that for SDLs emitting at 1060nm with pump spots of ~80µm diameter, the heatspreader approach outperforms the thin-device alternative, with the best results being obtained with a diamond heatspreader. Indeed, the thermal resistances are measured to be 4.9, 10.4 and 13.0 K/W for diamond-bonded, SiC-bonded and flip-chip devices respectively. It is also observed, as expected, that the thermal management strategy indirectly affects the optimum output coupling and thus the overall performance of these lasers.
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影响因子:
2.6
作者:
A. Zakharian;J. Hader;J. Moloney;S. Koch
通讯作者:
S. Koch
DOI:
10.1109/2944.605699
发表时间:
1996-10
期刊:
Conference Digest. 15th IEEE International Semiconductor Laser Conference
影响因子:
--
作者:
P. Smowton;P. Blood
通讯作者:
P. Smowton;P. Blood
DOI:
10.1364/oe.15.008212
发表时间:
2006
期刊:
2006 Conference on Lasers and Electro-Optics and 2006 Quantum Electronics and Laser Science Conference
影响因子:
--
作者:
J. Hopkins;A. J. Maclean;D. Burns;Erling Riis;N. Schulz;M. Rattunde;C. Manz;Klaus Köhler;Joachim Wagner
通讯作者:
Joachim Wagner
影响因子:
3.8
作者:
A. Härkönen;J. Rautiainen;M. Guina;J. Konttinen;P. Tuomisto;L. Orsila;M. Pessa;O. Okhotnikov
通讯作者:
O. Okhotnikov
影响因子:
4
作者:
Hastie, Jennifer E.;Morton, Lynne G.;Roberts, John S.
通讯作者:
Roberts, John S.