In-situ friction and wear responses of WS2 films to space environment: Vacuum and atomic oxygen
In-situ friction and wear responses of WS2 films to space environment: Vacuum and atomic oxygen
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WS2薄膜对空间环境的原位摩擦磨损响应：真空和原子氧
DOI：
10.1016/j.apsusc.2018.04.012
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发表时间：
2018-07
影响因子：
6.7
通讯作者：
Gao Xiaoming
中科院分区：
文献类型：
--
作者：
Xu Shusheng;Sun Jiayi;Weng Lijun;Hua Yong;Liu Weimin;Neville Anne;Hu Ming;Gao Xiaoming
研究了两种溅射WS 2薄膜在真空、原子氧（AO）和真空/AO辐照交替环境下的摩擦磨损性能。纯WS 2薄膜的微观结构疏松，由柱状晶和垂直孔组成，而致密的微观结构显示出较高的致密度。结果表明，WS 2薄膜在AO辐照和摩擦（原位）同步作用下，摩擦系数呈现周期性波动，磨损率较高。原位测定结果与常规的异位测定结果也有显著差异。当摩擦环境从真空切换到原位时，两种膜的摩擦系数从0.03增加到0.07，磨损寿命都下降到1.1 × 103周，而在真空中，疏松WS_2膜的磨损寿命可达1.7 × 104周，致密WS_2膜的磨损寿命大于2.3 × 104周。摩擦磨损性能与膜层的致密性无关，而与WS 2本身的抗氧化能力有关。在原位辐照条件下，由于AO生成氧化产物（WO_3）和摩擦相互作用导致的脱层，导致了高摩擦磨损。
The Friction and wear behavior of both sputtered WS2films with loose or dense microstructures were investigated in vacuum, atomic oxygen (AO) and vacuum/AO irradiation alternate environments. The loose microstructure of pure WS2film composed of columnar platelets and vertical pores and the dense microstructure showed high compactness. The results revealed that the WS2films exhibited a periodic fluctuant friction coefficient and high wear under the synchronization action of AO irradiation and friction (in-situcondition). The in-situ results also indicated significantly difference from that of conventionalex-situmethods. As the friction environments were switched from vacuum toin-situAO, the friction coefficients of the two types of films increased from 0.03 to 0.07 and the wear life of them declined identically to a small value of ∼1.1 × 103cycles, although the wear life of loose WS2film was up to 1.7 × 104cycles and that of the dense film was longer than 2.3 × 104cycles in vacuum. The friction and wear behavior did not depend on the film compactness but the anti-oxidation ability of WS2itself. Forin-situAO irradiation condition, the high friction resulted from the formation of oxidation product (WO3) by AO and its delamination by frictional interaction was responsible for high wear.
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影响因子：
6.7
作者：
Shusheng Xu;Xiaoming Gao;M. Hu;Jiayi Sun;D. Jiang;Feng Zhou;Wei-min Liu;L. Weng
通讯作者：
Shusheng Xu;Xiaoming Gao;M. Hu;Jiayi Sun;D. Jiang;Feng Zhou;Wei-min Liu;L. Weng
WS2 薄膜的原子氧电阻和摩擦学性能对微观结构的依赖性
影响因子：
6.7
作者：
Wang, Desheng;Zhou, Feng;Weng, Lijun;Liu, Weimin
通讯作者：
Liu, Weimin
影响因子：
4.6
作者：
Xiaobing Xie;R. Mccarley
通讯作者：
Xiaobing Xie;R. Mccarley
影响因子：
6.7
作者：
Hu, Ming;Gao, Xiaoming;Liu, Weimin
通讯作者：
Liu, Weimin
影响因子：
6.7
作者：
Gao, Xiaoming;Hu, Ming;Liu, Weimin
通讯作者：
Liu, Weimin