Metal- and additive-free photoinduced borylation of haloarenes.
Metal- and additive-free photoinduced borylation of haloarenes.
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DOI:
10.1038/nprot.2016.184
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发表时间:
2017-03
期刊:
影响因子:
14.8
通讯作者:
Larionov OV
中科院分区:
文献类型:
--
作者:
Mfuh AM;Schneider BD;Cruces W;Larionov OV
Boronic acids and esters have crucial roles in the areas of synthetic organic chemistry, molecular sensors, materials science, drug discovery, and catalysis. Many of the current applications of boronic acids and esters require materials with very low levels of transition metal contamination. Most of the current methods for the synthesis of boronic acids require, however, transition metal catalysts and ligands that have to be removed via additional purification procedures. This protocol describes a simple, metal- and additive-free method of conversion of haloarenes directly to boronic acids and esters. This photoinduced borylation protocol does not require expensive and toxic metal catalysts and ligands and produces innocuous and easy-to-remove by-products. Furthermore, the reaction can be carried out on multigram scales in common grade solvents without the need for reaction mixtures to be deoxygenated. The setup and purification steps are typically accomplished within 1–3 h. The reactions can be run overnight, and the protocol can be completed within 13–16 h. Two representative procedures that are described in this protocol provide details for preparation of a boronic acid (3-cyanopheylboronic acid) and a boronic ester (1,-benzenediboronic acid bis(pinacol)ester). We also discuss additional details of the method that will be helpful in the application of the protocol to other haloarene substrates.
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DOI:
10.1007/978-3-319-13054-5_10
发表时间:
2015-01-01
期刊:
SYNTHESIS AND APPLICATION OF ORGANOBORON COMPOUNDS
影响因子:
--
作者:
Jaekle, Frieder
通讯作者:
Jaekle, Frieder
影响因子:
15
作者:
Mfuh AM;Nguyen VT;Chhetri B;Burch JE;Doyle JD;Nesterov VN;Arman HD;Larionov OV
通讯作者:
Larionov OV
影响因子:
3.6
作者:
Mella, M;Coppo, P;Albini, A
通讯作者:
Albini, A
影响因子:
8.4
作者:
Chen K;Zhang S;He P;Li P
通讯作者:
Li P
影响因子:
3.8
作者:
Li, Gang;Schoneker, Dave;Kauffman, John F.
通讯作者:
Kauffman, John F.