Uniform doping of graphene close to the Dirac point by polymer-assisted assembly of molecular dopants.
Uniform doping of graphene close to the Dirac point by polymer-assisted assembly of molecular dopants.
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通过聚合物辅助的分子掺杂剂组装,将石墨烯均匀地掺杂了地石墨烯。
DOI:
10.1038/s41467-018-06352-5
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发表时间:
2018-09-27
影响因子:
16.6
通讯作者:
Lara-Avila S
中科院分区:
文献类型:
--
作者:
He H;Kim KH;Danilov A;Montemurro D;Yu L;Park YW;Lombardi F;Bauch T;Moth-Poulsen K;Iakimov T;Yakimova R;Malmberg P;Müller C;Kubatkin S;Lara-Avila S
Tuning the charge carrier density of two-dimensional (2D) materials by incorporating dopants into the crystal lattice is a challenging task. An attractive alternative is the surface transfer doping by adsorption of molecules on 2D crystals, which can lead to ordered molecular arrays. However, such systems, demonstrated in ultra-high vacuum conditions (UHV), are often unstable in ambient conditions. Here we show that air-stable doping of epitaxial graphene on SiC—achieved by spin-coating deposition of 2,3,5,6-tetrafluoro-tetracyano-quino-dimethane (F4TCNQ) incorporated in poly(methyl-methacrylate)—proceeds via the spontaneous accumulation of dopants at the graphene-polymer interface and by the formation of a charge-transfer complex that yields low-disorder, charge-neutral, large-area graphene with carrier mobilities ~70 000 cm2 V−1 s−1 at cryogenic temperatures. The assembly of dopants on 2D materials assisted by a polymer matrix, demonstrated by spin-coating wafer-scale substrates in ambient conditions, opens up a scalable technological route toward expanding the functionality of 2D materials. Incorporating dopants in the graphene lattice to tune its electronic properties is a challenging task. Here, the authors report a strategy to dope epitaxial large-area graphene on SiC by means of spin-coating deposition of F4TCNQ polymers in ambient conditions.
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影响因子:
17.1
作者:
Tsai HZ;Omrani AA;Coh S;Oh H;Wickenburg S;Son YW;Wong D;Riss A;Jung HS;Nguyen GD;Rodgers GF;Aikawa AS;Taniguchi T;Watanabe K;Zettl A;Louie SG;Lu J;Cohen ML;Crommie MF
通讯作者:
Crommie MF
影响因子:
56.9
作者:
Lin, Y. -M.;Dimitrakopoulos, C.;Avouris, Ph.
通讯作者:
Avouris, Ph.
影响因子:
5.5
作者:
Janssen, T. J. B. M.;Rozhko, S.;Yakimova, R.
通讯作者:
Yakimova, R.
影响因子:
8.6
作者:
Knap, Michael;Sau, Jay D.;Demler, Eugene
通讯作者:
Demler, Eugene
影响因子:
10.8
作者:
Mayorov, Alexander S.;Elias, Daniel C.;Gorbachev, Roman V.
通讯作者:
Gorbachev, Roman V.