Investigation to the Carrier Transport Properties in Heterojunction-Channel Amorphous Oxides Thin-Film Transistors Using Dual-Gate Bias
Investigation to the Carrier Transport Properties in Heterojunction-Channel Amorphous Oxides Thin-Film Transistors Using Dual-Gate Bias
复制标题
双栅偏压异质结沟道非晶氧化物薄膜晶体管载流子传输特性研究
DOI:
10.1109/led.2022.3223080
复制
发表时间:
2023-01
影响因子:
4.9
通讯作者:
Shengdong Zhang
中科院分区:
文献类型:
--
作者:
Huan Yang;Xiaoliang Zhou;Lei Lu;Shengdong Zhang
The carrier transport properties in amorphous oxide semiconductor (AOS) heterojunction thin-film transistors (TFTs) are investigated by using dual gates to control the channel of bilayer AOSs. The mobility of such heterojunction channel exhibited distinct dependences on top-gate (TG) voltage (<inline-formula> <tex-math notation="LaTeX">$V_{\text {TG}}$ </tex-math></inline-formula>) and bottom-gate (BG) voltage (<inline-formula> <tex-math notation="LaTeX">$V_{\text {BG}}$ </tex-math></inline-formula>) The mobility was well maintained in TG mode, where <inline-formula> <tex-math notation="LaTeX">$V_{\text {TG}}$ </tex-math></inline-formula> was in line with the build-in electric field of the electron potential well (PW) formed at the heterojunction interface. In contrast, an increased <inline-formula> <tex-math notation="LaTeX">$V_{\text {BG}}$ </tex-math></inline-formula> gradually reduced the high mobility to the level of a single layer channel, since a high <inline-formula> <tex-math notation="LaTeX">$V_{\text {BG}}$ </tex-math></inline-formula> in the opposite direction of PW could eliminate the PW. This experimentally clarifies that the high-mobility transport path of AOS heterojunction channel locates in the interface PW and its operation demands a proper gate field direction. This were directly consolidated by the disclosed unique capacitance-voltage characteristics.
登录
查看更多内容
影响因子:
3.7
作者:
Ji, Dongseob;Jang, Jisu;Noh, Yong-Young
通讯作者:
Noh, Yong-Young
DOI:
10.1002/sdtp.14615
发表时间:
2021-05
期刊:
SID Symposium Digest of Technical Papers
影响因子:
--
作者:
Jewel Kumer Saha;Arqum Ali;Mobaidul Islam;Ravindra Naik Bukke;Jin Jang
通讯作者:
Jewel Kumer Saha;Arqum Ali;Mobaidul Islam;Ravindra Naik Bukke;Jin Jang
影响因子:
64.8
作者:
Nomura, K;Ohta, H;Hosono, H
通讯作者:
Hosono, H
影响因子:
3.7
作者:
Gwon Byeon;S. Jang;Tae-Moo Roh;Ji‐Min Park;Hyunsook Kim;Yong‐Young Noh
通讯作者:
Gwon Byeon;S. Jang;Tae-Moo Roh;Ji‐Min Park;Hyunsook Kim;Yong‐Young Noh
影响因子:
4
作者:
Liu, G. X.;Liu, A.;Martins, R.
通讯作者:
Martins, R.