N dependent tribochemistry: Achieving superhard wear-resistant low-friction TaCxNy films
N dependent tribochemistry: Achieving superhard wear-resistant low-friction TaCxNy films
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N 相关摩擦化学：实现超硬耐磨低摩擦 TaCxNy 薄膜
DOI：
10.1016/j.surfcoat.2017.09.006
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发表时间：
2017-11
影响因子：
5.4
通讯作者：
Weitao Zheng
中科院分区：
文献类型：
--
作者：
Suxuan Du;Kan Zhang;Qingnan Meng;Ping Ren;Chaoquan Hu;Mao Wen;Weitao Zheng
耐磨低摩擦薄膜已被广泛应用于各种工程部件，以延长其使用寿命，其中薄膜的机械性能需要根据其预期的用途和接触情况进行优化。超硬耐磨低摩擦薄膜的设计和制造可以将机械零件的工作环境拓宽到一些苛刻的条件下，即受到硬质粒子的攻击。在N_2和Ar混合气体中溅射TaC复合靶，制备了超硬耐磨低摩擦TaC_xNy薄膜。固溶体TaCxNy薄膜中的N含量可以调节形成石墨团簇的价电子浓度和表面化学成分，同时在TaC0.60N0.33薄膜中获得最高硬度为41.5GPA，最低磨损率为0.6M×10−和6mm3/Nm的磨损率，同时摩擦系数(μ)为0.18。结果表明，固溶体TaCxNy薄膜的磨损率主要由硬度和硬度(H)与弹性模量(E)之比决定。结合拉曼光谱、X射线光电子能谱和透射电子显微镜的结果，可以确定摩擦化学为TaC_xNy+O_2·→_(TaO_X)+Al_C~(2+)+N_2/N_(NO_X)。μ的降低取决于剪切应力引起的摩擦化学反应中生成的石墨团簇的数量，这种数量可以通过N含量来调节。
Wear-resistant low-friction films have been widely applied to various engineered components to prolong their service lifetime, in which the mechanical properties of films need to be optimized for their intended applications and contact situations. The design and fabrication of superhard wear-resistant low-friction films can broaden the work situations of machine parts to some harsh conditions, i.e. subjecting to the attack of hard particles. Here, superhard wear-resistant low-friction TaCxNyfilms were deposited by sputtering a TaC composite target in the mixed discharge gases of N2and Ar. The N content in solid solution TaCxNyfilms can tailor the valence-electron concentration (VEC) and surface chemistry forming graphitic clusters, achieving the maximum hardness of 41.5 GPa and lowest wear rate of 0.6 × 10− 6mm3/Nm, coupled with low friction coefficient (μ) of 0.18 in TaC0.60N0.33film, simultaneously. The results show that the wear rate of solid solution TaCxNyfilms is mainly governed by hardness and the ratio of hardness (H) and elastic modulus (E). The tribochemistry could be identified as TaCxNy+ O2→ TaOx+ C + N2/ NOxby the combined results of Raman spectroscopy, X-ray photoelectron spectroscopy and transmission electron microscope. The reduction of theμis shown to depend on the amount of the graphitic clusters generated in tribochemical reaction caused by shear stress, which can be tailored by N content.
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影响因子：
19
作者：
O. Wilhelmsson;M. Råsander;Mattias Carlsson;E. Lewin;B. Sanyal;U. Wiklund;O. Eriksson;U. Jansson
通讯作者：
O. Wilhelmsson;M. Råsander;Mattias Carlsson;E. Lewin;B. Sanyal;U. Wiklund;O. Eriksson;U. Jansson
影响因子：
6.2
作者：
I. Shabalin;V. Vishnyakov;D. Bull;S. Keens;L. Yamshchikov;L. I. Shabalin
通讯作者：
I. Shabalin;V. Vishnyakov;D. Bull;S. Keens;L. Yamshchikov;L. I. Shabalin
DOI：
--
发表时间：
1996-12
期刊：
--
影响因子：
--
作者：
H. Pierson
通讯作者：
H. Pierson
溅射沉积 NbCxNy 薄膜：氮含量对结构以及机械和摩擦学性能的影响
影响因子：
5.4
作者：
Zhang, Kan;Wen, M.;Wang, S.;Deng, R.P.;Gall, D.;Zheng, W.T.
通讯作者：
Zheng, W.T.
影响因子：
5.4
作者：
E. Silva;M. R. Figueiredo;R. Franz;R. Galindo;C. Palacio;A. Espinosa;C. Mitterer;S. Carvalho
通讯作者：
E. Silva;M. R. Figueiredo;R. Franz;R. Galindo;C. Palacio;A. Espinosa;C. Mitterer;S. Carvalho