Sputter deposited NbCxNy films: Effect of nitrogen content on structure and mechanical and tribological properties
Sputter deposited NbCxNy films: Effect of nitrogen content on structure and mechanical and tribological properties
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溅射沉积 NbCxNy 薄膜：氮含量对结构以及机械和摩擦学性能的影响
DOI：
10.1016/j.surfcoat.2014.07.086
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发表时间：
2014-11
影响因子：
5.4
通讯作者：
Zheng, W.T.
中科院分区：
文献类型：
--
作者：
Zhang, Kan;Wen, M.;Wang, S.;Deng, R.P.;Gall, D.;Zheng, W.T.
在N2和Ar的混合气体中，采用Nb-C复合靶，用直流磁控溅射法在Si（100）衬底上沉积了NbCxNy薄膜。的机械和摩擦学性能表现出显着的依赖性的组成，化学键和结构，其特征在于通过X射线衍射，光电子和拉曼光谱。将氮气流速从0增加到5至30 sccm导致氮含量y从0连续增加到0.44至1.01。薄膜在低N含量时表现出Nb（C，N）固溶体，而当y ≥ 0.69时，薄膜中出现六方NbN相。NbC_（1.44）N_（0.44）薄膜的最大硬度H = 42.1 GPa，弹性模量E = 362 GPa，最大压应力为6.1 GPa，H3/E2值最大，耐磨性最好。增加N含量导致非晶相增加，这最终导致应力、硬度、H3/E2和耐磨性降低。氮也降低了均方根表面粗糙度从1.27到0.46 nm，并导致减少的摩擦由于sp2-graphiteclike碳相的增加，具有最低的摩擦系数为0.18的NbC1.99N0.69膜。
NbCxNythin films were deposited on Si(100) substrates by direct current magnetron sputtering from a Nb–C compound target in a mixture of N2and Ar. The mechanical and tribological properties show a significant dependency on composition, chemical bonding and structure, as characterized by X-ray diffraction, and photoelectron and Raman spectroscopies. Increasing the nitrogen flow rate from 0 to 5 to 30 sccm causes a continuous increase of the nitrogen content y from 0 to 0.44 to 1.01. The films exhibit a Nb(C,N) solid solution at low N content, while an additional hexagonal NbN phase develops for y ≥ 0.69. A maximum hardness H = 42.1 GPa and elastic modulus E = 362 GPa is reached for the NbC1.44N0.44film, which also exhibits the highest compressive stress of 6.1 GPa and the highest H3/E2value, yielding the best wear resistance. Increasing the N content leads to an increasing amorphous phase, which ultimately causes a reduction of stress, hardness, H3/E2, and wear resistance. The nitrogen also reduces the root mean square surface roughness from 1.27 to 0.46 nm, and causes a reduction of the friction due to an increase in the sp2-graphitelike carbon phase, with the lowest friction coefficient of 0.18 for the NbC1.99N0.69film.
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DOI：
10.1103/physreve.61.1904
发表时间：
2000-02
期刊：
Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics
影响因子：
--
作者：
Wang;Cohen;Ruzic;Goeckner
通讯作者：
Wang;Cohen;Ruzic;Goeckner
影响因子：
3.7
作者：
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通讯作者：
V. Ivashchenko;P. Turchi;E. Olifan
影响因子：
2.1
作者：
T. Francavilla;S. Wolf;E. Skelton
通讯作者：
T. Francavilla;S. Wolf;E. Skelton
影响因子：
5.4
作者：
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通讯作者：
E. Silva;M. R. Figueiredo;R. Franz;R. Galindo;C. Palacio;A. Espinosa;C. Mitterer;S. Carvalho
DOI：
10.1016/s0263-4368(99)00008-6
发表时间：
1999-01-01
影响因子：
3.6
作者：
Jindal, PC;Santhanam, AT;Shuster, AF
通讯作者：
Shuster, AF