Chromosome-Level Genome Assembly of the Hemiparasitic Taxillus chinensis (DC.) Danser.
Chromosome-Level Genome Assembly of the Hemiparasitic Taxillus chinensis (DC.) Danser.
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半寄生中国红豆杉的染色体水平基因组组装
DOI:
10.1093/gbe/evac060
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发表时间:
2022-05-03
影响因子:
3.3
通讯作者:
Pan, Limei
中科院分区:
文献类型:
--
作者:
Fu, Jine;Wan, Lingyun;Song, Lisha;He, Lili;Jiang, Ni;Long, Hairong;Huo, Juan;Ji, Xiaowen;Hu, Fengyun;Wei, Shugen;Pan, Limei
The hemiparasitic Taxillus chinensis (DC.) Danser is a root-parasitizing medicinal plant with photosynthetic ability, which is lost in other parasitic plants. However, the cultivation and medical application of the species are limited by the recalcitrant seeds of the species, and even though the molecular mechanisms underlying this recalcitrance have been investigated using transcriptomic and proteomic methods, genome resources for T. chinensis have yet to be reported. Accordingly, the aim of the present study was to use nanopore, short-read, and high-throughput chromosome conformation capture sequencing to construct a chromosome-level assembly of the T. chinensis genome. The final genome assembly was 521.90 Mb in length, and 496.43 Mb (95.12%) could be grouped into nine chromosomes with contig and scaffold N50 values of 3.80 and 56.90 Mb, respectively. In addition, a total of 33,894 protein-coding genes were predicted, and gene family clustering identified 11 photosystem-related gene families, thereby indicating photosynthetic ability, which is a characteristic of hemiparasitic plants. This chromosome-level genome assembly of T. chinensis provides a valuable genomic resource for elucidating the genetic basis underlying the recalcitrant characteristics of T. chinensis seeds and the evolution of photosynthesis loss in parasitic plants.
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影响因子:
14.9
作者:
Mistry J;Chuguransky S;Williams L;Qureshi M;Salazar GA;Sonnhammer ELL;Tosatto SCE;Paladin L;Raj S;Richardson LJ;Finn RD;Bateman A
通讯作者:
Bateman A
影响因子:
16.6
作者:
Chen Y;Nie F;Xie SQ;Zheng YF;Dai Q;Bray T;Wang YX;Xing JF;Huang ZJ;Wang DP;He LJ;Luo F;Wang JX;Liu YZ;Xiao CL
通讯作者:
Xiao CL
影响因子:
4.9
作者:
Bao W;Kojima KK;Kohany O
通讯作者:
Kohany O
影响因子:
5.8
作者:
Johnson, Andrew D.;Handsaker, Robert E.;de Bakker, Paul I. W.
通讯作者:
de Bakker, Paul I. W.
影响因子:
9.3
作者:
Durand NC;Shamim MS;Machol I;Rao SS;Huntley MH;Lander ES;Aiden EL
通讯作者:
Aiden EL