Scattering amplitudes and static atomic correction factors for the composition-sensitive 002 reflection in sphalerite ternary III-V and II-VI semiconductors.

Scattering amplitudes and static atomic correction factors for the composition-sensitive 002 reflection in sphalerite ternary III-V and II-VI semiconductors.
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闪锌矿三元 III-V 和 II-VI 半导体中成分敏感 002 反射的散射幅度和静态原子校正因子

DOI:
10.1107/s0108767311037779
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发表时间:
2012
期刊:
Acta crystallographica. Section A, Foundations of crystallography
影响因子:
--
通讯作者:
Andreas Rosenauer
Andreas Rosenauer
中科院分区:
--
文献类型:
--
作者:
Marco Schowalter;Knut Müller;Andreas Rosenauer

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修正的原子散射振幅(MASA),考虑到由于债券的电荷的重新分配,并考虑静态原子位移的影响计算的化学敏感的002反射三元III-V族和II-VI族半导体的相应的校正因子。MASA来自密度泛函理论形式主义内的计算。根据每个应变状态s(薄、中间、厚和完全松弛的电子显微镜样品)和每个浓度(x = 0,...,1,0.01步)使二元八原子单位晶胞应变,其中使用连续弹性理论计算应变状态s下的组成x的晶格参数。通过计算这些二元电池中的每一个的MASA导出浓度依赖性。利用八原子单胞的晶格参数,通过产生50 × 50 × 50的超胞,由弛豫原子位置计算了静态原子位移的修正因子。原子根据所需的成分随机分布。多项式拟合的MASA和不同应变状态的校正因子的组成依赖性。文中给出了拟合参数。
Modified atomic scattering amplitudes (MASAs), taking into account the redistribution of charge due to bonds, and the respective correction factors considering the effect of static atomic displacements were computed for the chemically sensitive 002 reflection for ternary III–V and II–VI semiconductors. MASAs were derived from computations within the density functional theory formalism. Binary eight-atom unit cells were strained according to each strain state s (thin, intermediate, thick and fully relaxed electron microscopic specimen) and each concentration (x = 0, …, 1 in 0.01 steps), where the lattice parameters for composition x in strain state s were calculated using continuum elasticity theory. The concentration dependence was derived by computing MASAs for each of these binary cells. Correction factors for static atomic displacements were computed from relaxed atom positions by generating 50 × 50 × 50 supercells using the lattice parameter of the eight-atom unit cells. Atoms were randomly distributed according to the required composition. Polynomials were fitted to the composition dependence of the MASAs and the correction factors for the different strain states. Fit parameters are given in the paper.
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