Influence of magnetic field strength on capacitively coupled CF4 discharge at different pressures
Influence of magnetic field strength on capacitively coupled CF4 discharge at different pressures
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不同压力下磁场强度对CF4电容耦合放电的影响
DOI:
10.1088/1361-6595/aca9f7
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发表时间:
2022-12
影响因子:
3.8
通讯作者:
Qiang Zhang
中科院分区:
文献类型:
--
作者:
Shali Yang;Hanlei Lin;Tianxiang Zhang;Yanli Peng;Qiang Zhang
The influence of a homogeneous magnetic field parallel to the electrodes on the plasma properties and electron heating mode was investigated by a one-dimensional particle-in-cell/Monte Carlo simulations in electronegative CF4 discharges. The discharge conditions are Z = 3.5 cm, f = 13.56 MHz, V0=300 V, and the various gas pressure of 10 mTorr, 100 mTorr and 200 mTorr. It is found that, in the absence of a magnetic field, the discharges are electronegative at different pressures and the electronegativity is stronger at higher pressure. When a homogeneous magnetic field is applied, the electron density significantly increases and the electronegativity decreases to varying degrees at different pressures. At p = 10 mTorr and p = 100 mTorr, a transition from a hybrid combination of α and drift-ambipolar (DA) modes into a pure α mode is induced by a weak magnetic field. At p = 200 mTorr, a transition from a DA mode into a hybrid combination of α and DA modes is induced by a relatively high magnetic field. The strength of the magnetic field required to induce mode transition becomes stronger at higher gas pressures. This is because increasing the pressure reduces the mean free path and the frequent electron-neutral collisions disrupt electron gyromotion, thus the effects of the magnetic field are greatly reduced.
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影响因子:
3.8
作者:
Li Wang;De-Qi Wen;Perter Hartmann;Zoltan Donko;Aranka Dersi;Xi-Feng Wang;Yuan-Hong Song;You-Nian Wang;Julian Schulze
通讯作者:
Julian Schulze
DOI:
10.1088/0022-3727/28/2/015
发表时间:
1995-02
期刊:
Journal of Physics D
影响因子:
--
作者:
K. Nanbu;Y. Kitatani
通讯作者:
K. Nanbu;Y. Kitatani
DOI:
10.1088/0963-0252/19/4/045023
发表时间:
2010-01
期刊:
Plasma Sources Sci. Technol.
影响因子:
--
作者:
Hong-yu Wang;You-nian Wang;Wei Jiang
通讯作者:
Wei Jiang
DOI:
10.1116/1.581259
发表时间:
1998-10
期刊:
Journal of Vacuum Science and Technology
影响因子:
--
作者:
K. Denpoh;K. Nanbu
通讯作者:
K. Denpoh;K. Nanbu
影响因子:
2.2
作者:
S. Binwal;Y. Patil;S. Karkari;L. Nair
通讯作者:
S. Binwal;Y. Patil;S. Karkari;L. Nair