Edge illumination and coded-aperture X-ray phase-contrast imaging: increased sensitivity at synchrotrons and lab-based translations into medicine, biology and materials science
Edge illumination and coded-aperture X-ray phase-contrast imaging: increased sensitivity at synchrotrons and lab-based translations into medicine, biology and materials science
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边缘照明和编码孔径 X 射线相衬成像:提高同步加速器的灵敏度以及基于实验室的医学、生物学和材料科学转化
DOI:
10.1117/12.2007893
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发表时间:
2013
期刊:
影响因子:
--
通讯作者:
Endrizzi M
中科院分区:
文献类型:
--
作者:
Endrizzi M
The edge illumination principle was first proposed at Elettra (Italy) in the late nineties, as an alternative method for achieving high phase sensitivity with a very simple and flexible set-up, and has since been under continuous development in the radiation physics group at UCL. Edge illumination allows overcoming most of the limitations of other phase-contrast techniques, enabling their translation into a laboratory environment. It is relatively insensitive to mechanical and thermal instabilities and it can be adapted to the divergent and polychromatic beams provided by X-ray tubes. This method has been demonstrated to work efficiently with source sizes up to 100m, compatible with state-of-the-art mammography sources. Two full prototypes have been built and are operational at UCL. Recent activity focused on applications such as breast and cartilage imaging, homeland security and detection of defects in composite materials. New methods such as phase retrieval, tomosynthesis and computed tomography algorithms are currently being theoretically and experimentally investigated. These results strongly indicate the technique as an extremely powerful and versatile tool for X-ray imaging in a wide range of applications.
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DOI:
10.3390/ma4101846
发表时间:
2011-10-17
期刊:
Materials (Basel, Switzerland)
影响因子:
--
作者:
Ignatyev K;Munro PRT;Chana D;Speller RD;Olivo A
通讯作者:
Olivo A
影响因子:
4
作者:
Vine, D. J.;Paganin, D. M.;Foerster, E.
通讯作者:
Foerster, E.
影响因子:
1.3
作者:
M. Endrizzi;P. Diemoz;P. Munro;C. Hagen;M. Szafraniec;T. P. Millard;C. Zapata;R. Speller;A. Olivo
通讯作者:
M. Endrizzi;P. Diemoz;P. Munro;C. Hagen;M. Szafraniec;T. P. Millard;C. Zapata;R. Speller;A. Olivo
DOI:
10.1002/crat.19800150812
发表时间:
1980-01-01
期刊:
KRISTALL UND TECHNIK-CRYSTAL RESEARCH AND TECHNOLOGY
影响因子:
--
作者:
FORSTER, E;GOETZ, K;ZAUMSEIL, P
通讯作者:
ZAUMSEIL, P