Van der Waals epitaxial growth and optoelectronics of large-scale WSe(2)/SnS(2) vertical bilayer p-n junctions.
Van der Waals epitaxial growth and optoelectronics of large-scale WSe(2)/SnS(2) vertical bilayer p-n junctions.
复制标题
大规模WSe2/SnS2垂直双层p-n结的范德华外延生长和光电子学
DOI:
10.1038/s41467-017-02093-z
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发表时间:
2017-12-04
影响因子:
16.6
通讯作者:
Pan A
中科院分区:
文献类型:
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作者:
Yang T;Zheng B;Wang Z;Xu T;Pan C;Zou J;Zhang X;Qi Z;Liu H;Feng Y;Hu W;Miao F;Sun L;Duan X;Pan A
High-quality two-dimensional atomic layered p–n heterostructures are essential for high-performance integrated optoelectronics. The studies to date have been largely limited to exfoliated and restacked flakes, and the controlled growth of such heterostructures remains a significant challenge. Here we report the direct van der Waals epitaxial growth of large-scale WSe2/SnS2 vertical bilayer p–n junctions on SiO2/Si substrates, with the lateral sizes reaching up to millimeter scale. Multi-electrode field-effect transistors have been integrated on a single heterostructure bilayer. Electrical transport measurements indicate that the field-effect transistors of the junction show an ultra-low off-state leakage current of 10−14 A and a highest on–off ratio of up to 107. Optoelectronic characterizations show prominent photoresponse, with a fast response time of 500 μs, faster than all the directly grown vertical 2D heterostructures. The direct growth of high-quality van der Waals junctions marks an important step toward high-performance integrated optoelectronic devices and systems. Growth of large area and defect-free two-dimensional semiconductor layers for high-performance p–n junction applications has been a great challenge. Yang et al. prepare millimeter-scaled WSe2/SnS2 vertical heterojunctions by two-step van der Waals epitaxy, which show excellent optoelectronic properties.
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影响因子:
17.1
作者:
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通讯作者:
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