High-speed graphene transistors with a self-aligned nanowire gate.
High-speed graphene transistors with a self-aligned nanowire gate.
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Graphene has attracted considerable interest as a potential new electronic material. With the highest carrier mobility exceeding 200,000 cm2/V·s, graphene is of particular interest for ultra-high speed radio frequency (RF) electronics. However, the conventional dielectric integration and device fabrication processes cannot be readily applied to fabricate high speed graphene transistors because they can often introduce significant defects into the monolayer of carbon lattices and severely degrade the device performance. Here we report a new approach to fabricate high-speed graphene transistors with a self-aligned nanowire gate to enable unprecedented performance. The graphene transistors are fabricated using a Co2Si/Al2O3 core/shell nanowire as the gate, with the source and drain electrodes defined through a self-alignment process and the channel length defined by the nanowire diameter. The physical assembly of nanowire gate preserves the high carrier mobility in graphene, and the self-aligned process ensures that the edges of the source, drain, and gate electrodes are automatically and precisely positioned so that no overlapping or significant gaps exist between these electrodes and thus minimizes access resistance. It therefore enables transistor performance not previously possible. Graphene transistors with channel length down to 140 nm have been fabricated with the highest scaled on-current (3.32 mA μm−1) and transconductance (1.27 mS μm−1) reported to date. Significantly, on-chip microwave measurements demonstrate that the self-aligned devices exhibit a record high intrinsic cutoff frequency (fT) in the range of 100–300 GHz, with the extrinsic fT in the range of a few gigahertz largely limited by parasitic pad capacitance. The reported intrinsic cutoff frequency of the graphene transistors is comparable to that of the very best high electron mobility transistors with similar gate lengths. It therefore marks an important milestone in graphene RF devices and can enable exciting opportunities in high-speed electronics.
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影响因子:
4
作者:
Murali, Raghunath;Yang, Yinxiao;Meindl, James D.
通讯作者:
Meindl, James D.
影响因子:
56.9
作者:
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通讯作者:
Avouris, Ph.
影响因子:
4.9
作者:
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通讯作者:
Gaskill, D. K.
影响因子:
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作者:
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通讯作者:
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影响因子:
29.4
作者:
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通讯作者:
Duan, Xiangfeng