Identification of doubly excited states in nonsequential double ionization of Ar in strong laser fields
Identification of doubly excited states in nonsequential double ionization of Ar in strong laser fields
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强激光场中Ar非连续双电离双激发态的识别
DOI：
10.1088/1361-6455/aa948f
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发表时间：
2017-12
期刊：
影响因子：
--
通讯作者：
Chen Jing
中科院分区：
文献类型：
--
作者：
Chen Zhangjin;Li Xiaojin;Sun Xiaoli;Hao Xiaolei;Chen Jing
利用半经典模型研究了短脉冲强激光作用下Ar原子的非序贯双电离（NSDI）的强度依赖性。通过跟踪两个出射电子的能量轨迹，确定了双激发态（SIDE）的顺序电离对NSDI的贡献。计算了相关电子动量分布，得到了快电子和慢电子在并排和背靠背发射时的纵向动量分布。通过波长为795 nm、强度为7 × 1013 W cm−2的线偏振场模拟的Ar的NSDI的快电子和慢电子的动量分布与Liu等人的实验测量结果（2014 Phys. Rev. Lett. 112 013003）。我们表明，通过SIDE的双电离过程占主导地位的NSDI只有当激光强度低于fillision阈值;然而，对于较高的强度的SIDE过程仍然发生，虽然对NSDI产量的贡献迅速下降，随着强度的增加。结果表明，对于不同强度的SIDE，关联电子动量谱和快、慢电子的动量分布保持不变。
We use the semiclassical model to study the intensity dependence of nonsequential double ionization (NSDI) of Ar in short strong laser pulses. The contributions to NSDI through sequential ionization of doubly excited states (SIDE) are identified by tracking the energy trajectories of the two outgoing electrons. The correlated electron momentum distributions are calculated from which the longitudinal momentum distributions of the fast and the slow electrons for the side-by-side and the back-to-back emissions are obtained. The simulated momentum distributions of the fast and the slow electrons for NSDI of Ar by linearly polarized fields with a wavelength of 795 nm at an intensity of 7 × 1013 W cm−2 are in good agreement with the experimental measurements of Liu et al (2014 Phys. Rev. Lett. 112 013003). We demonstrate that the process of double ionization through SIDE dominates NSDI only when the laser intensities are below the recollision threshold; nevertheless, for higher intensities the SIDE process still takes place although the contribution to the NSDI yields decreases rapidly as the intensity increases. It has been found that for SIDE at different intensities, both the correlated electron momentum spectra and the momentum distributions of the fast and the slow electrons remain the same.
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强激光场中氦原子双单电离比的数值模拟
影响因子：
2.9
作者：
Klaus Bartschat;Toru Morishita;Song-Feng Zhao;C. D. Lin
通讯作者：
C. D. Lin
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影响因子：
2.9
作者：
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通讯作者：
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DOI：
10.1088/0953-4075/36/15/308
发表时间：
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期刊：
Journal of Physics B
影响因子：
--
作者：
E. Eremina;Xiaojun Liu;H. Rottke;W. Sandner;A. Dreischuh;F. Lindner;F. Grasbon;G. Paulus;H. Walther;R. Moshammer;B. Feuerstein;J. Ullrich
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影响因子：
2.9
作者：
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通讯作者：
D. Ye;Jie Liu
影响因子：
8.6
作者：
FITTINGHOFF, DN;BOLTON, PR;KULANDER, KC
通讯作者：
KULANDER, KC