Diffractive microlens with a cascade focal plane fabricated by single mask UV-photolithography and common KOH:H2O etching
Diffractive microlens with a cascade focal plane fabricated by single mask UV-photolithography and common KOH:H2O etching
复制标题
通过单掩模紫外光刻和普通 KOH:H2O 蚀刻制造的具有级联焦平面的衍射微透镜
DOI：
10.1088/0960-1317/20/10/105029
复制
发表时间：
2010-10
影响因子：
2.3
通讯作者：
Zhang, Tianxu
中科院分区：
文献类型：
--
作者：
Ji, An;Xie, Changsheng;Zhang, Xinyu;Liu, Kan;Luo, Jun;Li, Hui;Zhang, Tianxu
采用低成本技术制造了沿器件主光轴具有级联焦平面的衍射微透镜，主要包括单掩模紫外（UV）光刻和双步KOH:H2O蚀刻。基于在 KOH 蚀刻剂中在 {1 0 0} 取向的硅片上预成型的逆金字塔形微孔 (CPSM) 的演化行为，进行第一步 KOH 蚀刻，将通过等离子体增强化学气相沉积 (PECVD) 生长并通过单掩模 UV 光刻图案化的 SiO2 薄膜中的初始方形微开口转移到具有所需尺寸的 CPSM。完全去除减薄的SiO2掩模后，可以在CPSM通过第二步KOH蚀刻演化出的相邻硅凹弧微结构之间的重叠蚀刻区域中形成具有相对陡峭侧壁和预定高度的基本环形相台阶。形态测量表明硅微透镜的表面具有纳米级的粗糙度和亚微米范围内形成的相台阶的特征高度。通过在镍掩模上进一步热压印精细微浮雕相位图而获得的塑料衍射微透镜的常规光学测量表明其具有高效的级联聚焦性能。
A diffractive microlens with a cascade focal plane along the main optical axis of the device is fabricated using a low-cost technique mainly including single mask ultraviolet (UV) photolithography and dual-step KOH:H2O etching. Based on the evolutionary behavior of converse pyramid-shaped microholes (CPSMs) preshaped over a {1 0 0}-oriented silicon wafer in KOH etchant, the first-step KOH etching is performed to transfer initial square micro-openings in a SiO2 film grown by plasma enhanced chemical vapor deposition (PECVD) and patterned by single mask UV-photolithography, into CPSMs with needed dimension. After completely removing a thinned SiO2 mask, basic annular phase steps with a relatively steep sidewall and scheduled height can be shaped in the overlapped etching region between the neighboring silicon concave-arc microstructures evolved from CPSMs through the second-step KOH etching. Morphological measurements demonstrate a desirable surface of the silicon microlens with a roughness in nanometer scale and the feature height of the phase steps formed in the submicrometer range. Conventional optics measurements of the plastic diffractive microlens obtained by further hot embossing the fine microrelief phase map over the nickel mask made through a common electrochemical method indicate a highly efficient cascaded focusing performance.
登录
查看更多内容
影响因子：
1.9
作者：
Liu, J. S.;Caley, A. J.;Taghizadeh, M. R.
通讯作者：
Taghizadeh, M. R.
影响因子：
3.6
作者：
N. Sanner;N. Huot;É. Audouard;C. Larat;J. Huignard;B. Loiseaux
通讯作者：
N. Sanner;N. Huot;É. Audouard;C. Larat;J. Huignard;B. Loiseaux
影响因子：
3.8
作者：
Yongqi Fu;N. Bryan
通讯作者：
Yongqi Fu;N. Bryan
影响因子：
2.4
作者：
Chii-Chang Chen;Ming Li;Chih-Yang Chang;J. Sheu;G. Chi;W. Cheng;J. Yeh;Jenq-Yang Chang;Toshiaki Ito
通讯作者：
Chii-Chang Chen;Ming Li;Chih-Yang Chang;J. Sheu;G. Chi;W. Cheng;J. Yeh;Jenq-Yang Chang;Toshiaki Ito
影响因子：
1.3
作者：
D. L. Kendall;W. Eaton;R. Manginell;T. Digges
通讯作者：
D. L. Kendall;W. Eaton;R. Manginell;T. Digges