A low-noise CMOS pixel direct charge sensor, Topmetal-II-
A low-noise CMOS pixel direct charge sensor, Topmetal-II-
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低噪声 CMOS 像素直充传感器 Topmetal-II-
DOI:
10.1016/j.nima.2015.11.153
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发表时间:
2015-09
影响因子:
1.4
通讯作者:
Zhou Wei
中科院分区:
文献类型:
--
作者:
An Mangmang;Chen Chufeng;Gao Chaosong;Han Mikyung;Ji Rong;Li Xiaoting;Mei Yuan;Sun Quan;Sun Xiangming;Wang Kai;Xiao Le;Yang Ping;Zhou Wei
We report the design and characterization of a CMOS pixel direct charge sensor, Topmetal-II-, fabricated in a standard 0.35 μm CMOS Integrated Circuit process. The sensor utilizes exposed metal patches on top of each pixel to directly collect charge. Each pixel contains a low-noise charge-sensitive preamplifier to establish the analog signal and a discriminator with tunable threshold to generate hits. The analog signal from each pixel is accessible through time-shared multiplexing over the entire array. Hits are read out digitally through a column-based priority logic structure. Tests show that the sensor achieved a< 15 e− analog noise and a 200 e− minimum threshold for digital readout per pixel. The sensor is capable of detecting both electrons and ions drifting in gas. These characteristics enable its use as the charge readout device in future Time Projection Chambers without gaseous gain mechanism, which has unique advantages in low background and low rate-density experiments.
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DOI:
10.1016/j.nima.2004.11.036
发表时间:
2004-09
影响因子:
1.4
作者:
M. Campbell;M. Chefdeville;P. Colas;A. Colijn;A. Fornaini;Y. Giomataris;H. Graaf;E. Heijne;P. Kluit;X. Llopart;Jurriaan Schmitz;J. Timmermans;J. Visschers
通讯作者:
M. Campbell;M. Chefdeville;P. Colas;A. Colijn;A. Fornaini;Y. Giomataris;H. Graaf;E. Heijne;P. Kluit;X. Llopart;Jurriaan Schmitz;J. Timmermans;J. Visschers
影响因子:
1.8
作者:
Michael S. Gordon;D. Heidel;K. Rodbell;B. Dwyer-McNally;William K. Warburton
通讯作者:
Michael S. Gordon;D. Heidel;K. Rodbell;B. Dwyer-McNally;William K. Warburton
影响因子:
1.4
作者:
Titov, Maxim;Ropelewski, Leszek
通讯作者:
Ropelewski, Leszek
DOI:
10.1016/j.nima.2004.07.269
发表时间:
2004-12-11
影响因子:
1.4
作者:
Bellazzini, R;Angelini, F;Soffitta, P
通讯作者:
Soffitta, P
影响因子:
3.5
作者:
J. Marx;D. Nygren
通讯作者:
J. Marx;D. Nygren