Single-Side Fabrication of Multilevel 3-D Microstructures for Monolithic Dual Sensors

Single-Side Fabrication of Multilevel 3-D Microstructures for Monolithic Dual Sensors
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用于单片双传感器的多级 3D 微结构的单面制造

DOI:
10.1109/jmems.2015.2423296
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发表时间:
2015-05
影响因子:
2.7
通讯作者:
Xinxin Li
Xinxin Li
中科院分区:
工程技术3区
文献类型:
--
作者:
Jiachou Wang;Xinxin Li

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微机械复合传感器的单片集成需要制造多个层次的三维 (3-D) 微结构,以满足各个片上传感元件的个性化要求。同时,在许多更喜欢低成本非绝缘体上硅单晶片单面工艺的应用中,需要批量制造复合传感器。本文提出并开发了一种新颖的单面微加工技术来形成这种多级3D结构,其中仅使用集成电路(IC)代工可用的工艺,即既不使用双面工艺也不使用晶圆键合。通过与 IC 代工厂兼容的微加工工艺,已成功形成用于轮胎压力监测系统 (TPMS) 传感器的六级 3D 微结构。得益于单面工艺和加速计压力传感器 (PinG) 双传感器架构,基于单晶圆的双传感器具有 1.25 mm × 1.25 mm × 0.45 mm 的微小芯片尺寸。提供 3.3 V、500 kPa 范围的压力传感器的 0.1 mV/kPa 灵敏度和 120 g 范围的加速度计的 0.05 mV/g 灵敏度进行测量。通过将压力传感器结构自由地悬挂在无应力质量端,很好地消除了加速度对压力传感器的影响,这是以前PinG传感器的主要问题。除了已实现的高性能TPMS双传感器外,多级3D微机电系统(MEMS)结构的IC代工可制造技术还可广泛应用于各种单片MEMS器件。
Monolithic integration of micromechanical composite sensors needs to fabricate multiple levels of three-dimensional (3-D) microstructures to satisfy individual requirements from individual onchip sensing elements. Meanwhile, volume fabrication of the composite sensors is needed in many applications that prefer single-sided process in low-cost non-silicon-on-insulator single wafer. A novel single-sided micromachining technique is herein proposed and developed to form such multilevel 3-D structures, where only integrated-circuit (IC) foundry available processes are used, i.e., neither double-sided process nor wafer-bonding is used. With the IC-foundry compatible micromachining process, a six-level 3-D microstructure has been successfully formed for tire-pressure monitoring system (TPMS) sensors. Benefited from the single-side process and the namely pressure-sensor in accelerometer (PinG) dual-sensor architecture, the single-wafer-based dual-sensor features a tiny chip size of 1.25 mm × 1.25 mm × 0.45 mm. Supplied with 3.3 V, 0.1-mV/kPa sensitivity for the 500-kPa-ranged pressure sensor and 0.05-mV/g sensitivity for the 120-g-ranged accelerometer are measured. By freely suspending the pressure-sensor structure from the stress-free mass end, the influence of acceleration to the pressure sensor is well eliminated, which was the main problem of the previous PinG sensors. Besides the achieved high-performance TPMS dual sensor, the IC-foundry manufacturable technique for multilevel 3-D microelectromechanical systems (MEMS) structures can be widely used in various monolithic MEMS devices.
DOI: 10.1109/iedm.1999.824248
发表时间: 1999
期刊: International Electron Devices Meeting 1999. Technical Digest (Cat. No.99CH36318)
影响因子: --
作者:
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