Single-Side Fabrication of Multilevel 3-D Microstructures for Monolithic Dual Sensors
Single-Side Fabrication of Multilevel 3-D Microstructures for Monolithic Dual Sensors
复制标题
用于单片双传感器的多级 3D 微结构的单面制造
DOI:
10.1109/jmems.2015.2423296
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发表时间:
2015-05
影响因子:
2.7
通讯作者:
Xinxin Li
中科院分区:
文献类型:
--
作者:
Jiachou Wang;Xinxin Li
Monolithic integration of micromechanical composite sensors needs to fabricate multiple levels of three-dimensional (3-D) microstructures to satisfy individual requirements from individual onchip sensing elements. Meanwhile, volume fabrication of the composite sensors is needed in many applications that prefer single-sided process in low-cost non-silicon-on-insulator single wafer. A novel single-sided micromachining technique is herein proposed and developed to form such multilevel 3-D structures, where only integrated-circuit (IC) foundry available processes are used, i.e., neither double-sided process nor wafer-bonding is used. With the IC-foundry compatible micromachining process, a six-level 3-D microstructure has been successfully formed for tire-pressure monitoring system (TPMS) sensors. Benefited from the single-side process and the namely pressure-sensor in accelerometer (PinG) dual-sensor architecture, the single-wafer-based dual-sensor features a tiny chip size of 1.25 mm × 1.25 mm × 0.45 mm. Supplied with 3.3 V, 0.1-mV/kPa sensitivity for the 500-kPa-ranged pressure sensor and 0.05-mV/g sensitivity for the 120-g-ranged accelerometer are measured. By freely suspending the pressure-sensor structure from the stress-free mass end, the influence of acceleration to the pressure sensor is well eliminated, which was the main problem of the previous PinG sensors. Besides the achieved high-performance TPMS dual sensor, the IC-foundry manufacturable technique for multilevel 3-D microelectromechanical systems (MEMS) structures can be widely used in various monolithic MEMS devices.
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DOI:
10.1109/iedm.1999.824248
发表时间:
1999
期刊:
International Electron Devices Meeting 1999. Technical Digest (Cat. No.99CH36318)
影响因子:
--
作者:
Sangwoo Lee;Sangjun Park;Dong-il Cho;Yongsoo Oh
通讯作者:
Sangwoo Lee;Sangjun Park;Dong-il Cho;Yongsoo Oh
影响因子:
3.9
作者:
SEIDEL, H;CSEPREGI, L;BAUMGARTEL, H
通讯作者:
BAUMGARTEL, H
影响因子:
4.9
作者:
Wang, Jiachou;Li, Xinxin
通讯作者:
Li, Xinxin
DOI:
10.1088/0960-1317/19/1/015023
发表时间:
2009-01-01
影响因子:
2.3
作者:
Sun, Chih-Ming;Wang, Chuanwei;Fang, Weileun
通讯作者:
Fang, Weileun
DOI:
10.1016/b978-044451616-9/50004-7
发表时间:
2000-12
期刊:
--
影响因子:
--
作者:
M. Bao
通讯作者:
M. Bao