Dynamics of ultrashort pulsed laser radiation induced non-thermal ablation of graphite
Dynamics of ultrashort pulsed laser radiation induced non-thermal ablation of graphite
复制标题
超短脉冲激光辐射诱导石墨非热烧蚀动力学
DOI：
10.1007/s00339-014-8864-7
复制
发表时间：
2014
期刊：
影响因子：
--
通讯作者：
Stampfer
中科院分区：
文献类型：
--
作者：
Reininghaus;Kalupka;Holtum;Finger;Stampfer
本文报道了激光诱导石墨烧蚀过程与脉冲宽度小于4微秒的超短脉冲激光的关系。新出现的所谓的石墨非热烧蚀过程已经被证实能够物理地将超薄的石墨层从原始的石墨块体晶体的表面分离出来。这允许在靶材附近的衬底上沉积烧蚀的石墨片。在不同脉冲持续时间下观察到的烧蚀阈值显示了一种调制，我们将其归因于晶格沿轴线的运动，理论上预测这种运动将导致非热烧蚀过程。在一种简单的方法中，烧蚀阈值可以描述为能量穿透深度和所施加的超短脉冲激光辐射的吸收的函数。通过对这两个决定因素的脉宽依赖关系的分析和烧蚀过程不变的假设，我们能够再现烧蚀阈值的脉宽依赖关系。此外，观察到的脉冲持续时间依赖关系证实了在第一个2ps内光激发后石墨靶的快速材料特定响应的假设。
We report on the dependence of a laser radiation induced ablation process of graphite on the applied pulse duration of ultrashort pulsed laser radiation smaller than 4 ps. The emerging so-called non-thermal ablation process of graphite has been confirmed to be capable to physically separate ultrathin graphitic layers from the surface of pristine graphite bulk crystal. This allows the deposition of ablated graphitic flakes on a substrate in the vicinity of the target. The observed ablation threshold determined at different pulse durations shows a modulation, which we ascribe to lattice motions along thecaxis that are theoretically predicted to induce the non-thermal ablation process. In a simple approach, the ablation threshold can be described as a function of the energy penetration depth and the absorption of the applied ultrashort pulsed laser radiation. Based on the analysis of the pulse duration dependence of those two determining factors and the assumption of an invariant ablation process, we are able to reproduce the pulse duration dependence of the ablation threshold. Furthermore, the observed pulse duration dependences confirm the assumption of a fast material specific response of graphite target subsequent to optical excitation within the first 2 ps.
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影响因子：
4
作者：
M. Reininghaus;D. Wortmann;J. Finger;O. Faley;R. Poprawe;C. Stampfer
通讯作者：
M. Reininghaus;D. Wortmann;J. Finger;O. Faley;R. Poprawe;C. Stampfer
影响因子：
8.6
作者：
Jeschke, HO;Garcia, ME;Bennemann, KH
通讯作者：
Bennemann, KH
影响因子：
3.7
作者：
Lenner, M.;Kaplan, A.;Palmer, R. E.
通讯作者：
Palmer, R. E.
DOI：
--
发表时间：
2000
期刊：
影响因子：
--
作者：
K. Sokolowski;S. Kudryashov;V. Temnov;J. Bialkowski;D. Linde;A. Cavalleri;H. Jeschke;Martin E. Garcia;K. Bennemann
通讯作者：
K. Bennemann