Micro-SACE scanning process with different tool-surface roughness
Micro-SACE scanning process with different tool-surface roughness
复制标题
不同刀具表面粗糙度的Micro-SACE扫描过程
DOI：
10.1080/10426914.2020.1762209
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发表时间：
2020-06
影响因子：
4.8
通讯作者：
Junjie Li
中科院分区：
文献类型：
--
作者：
Yubin Pu;Hao Tong;Bolin Ji;Yong Li;Junjie Li
摘要：作为一种非传统加工工艺，火花辅助化学雕刻（SACE）可以加工硬、脆、非导电材料。工具电极侧壁上的火花放电会导致能量损失和过切边缘。通常使用侧壁覆盖有绝缘膜的工具电极来将放电限制到工具电极端。然而，绝缘膜的制备不仅谨慎、繁琐，而且在SACE的高温高压作用下很容易剥落。在本研究中，提出了一种通过改变工具电极表面粗糙度来将微SACE放电限制在工具电极端的新方法。具有粗糙端部和光滑侧壁的特殊微型工具电极是在机器上制造的。通过观察工具电极端部周围SACE气泡和放电的分布情况来实验约束效果，并通过评估气泡长宽比来获得最佳参数。此外，在ZrO2陶瓷这种难加工材料上验证了通过将放电约束到工具电极端部的微SACE扫描过程的加工实验。利用Φ300μm工具电极成功加工出无微裂纹的微圆凹槽。
ABSTRACT As a non-traditional machining process, spark assisted chemical engraving (SACE) can machine hard, brittle, and non-conducting materials. The spark discharges on tool-electrode sidewall result in energy loss and overcut edges. A tool electrode covered with an insulating film on its sidewall is usually used to constrain the discharges to the tool-electrode end. However, not only the preparation of the insulating film is cautious and fussy, but also it is easy to split away under the high temperature and pressure action of SACE. In this research, a novel method constraining the micro-SACE discharges to the tool-electrode end was proposed by changing surface roughness of the tool electrode. The special micro-tool electrode with rough end and smooth sidewall was fabricated on-machine. The constraint effect was experimented by observing the distribution of SACE bubbles and discharges around the tool-electrode end, and the optimal parameters were obtained by evaluating the bubble aspect ratio. Furthermore, machining experiments of the micro-SACE scanning process by constraining discharges to tool-electrode end were verified on ZrO2 ceramics as a kind of difficult-to-machine material. Micro-circular grooves without micro cracks were successfully machined by the use of a Φ300 μm tool electrode.
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DOI：
10.1504/ijcat.2007.015271
发表时间：
2007-10
期刊：
Int. J. Comput. Appl. Technol.
影响因子：
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作者：
B. Jia;W. Bian;Z. L. Wang;W. Zhao
通讯作者：
B. Jia;W. Bian;Z. L. Wang;W. Zhao
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DOI：
10.1088/1361-6463/ab16b6
发表时间：
2019-05
期刊：
Journal of Physics D: Applied Physics
影响因子：
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作者：
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通讯作者：
Wu Yifei
DOI：
10.1016/j.precisioneng.2009.01.001
发表时间：
2009-10-01
影响因子：
3.6
作者：
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通讯作者：
Chu, Chong Nam
影响因子：
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作者：
P. Gupta
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影响因子：
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作者：
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