Time-resolved operando analysis of the pyrolysis of a PECVD-deposited siloxane polymer using a combined DRIFTS–MS system
Time-resolved operando analysis of the pyrolysis of a PECVD-deposited siloxane polymer using a combined DRIFTS–MS system
复制标题
使用组合 DRIFTS–MS 系统对 PECVD 沉积的硅氧烷聚合物的热解进行时间分辨操作分析
DOI:
10.1039/d3me00032j
复制
发表时间:
2023
影响因子:
3.6
通讯作者:
Tsotsis, Theodore
中科院分区:
文献类型:
--
作者:
Nguyen, Bryan;Tabarkhoon, Farnaz;Zhao, Linghao;Mishra, Ankit;Gupta, Malancha;Vashishta, Priya;Tsotsis, Theodore
Silicon-type thin films, made of silica, silicon carbide (SiC), or oxycarbide, find use as membranes and electronic sensors, and in semiconductor and solar energy applications. Previously, we studied the preparation of nanoporous silica membranes via deposition of poly(1,3,5,7-tetravinyl-1,3,5,7-tetramethylcyclotetrasiloxane) (pV4D4) films onto SiC macroporous substrates via initiated chemical vapor deposition (iCVD) and their subsequent controlled-atmosphere pyrolysis. Here, we utilize a different method, plasma-enhanced chemical vapor deposition (PECVD), to deposit thin pV4D4 films onto a variety of substrates at significantly higher deposition rates than iCVD and employ a number of experimental techniques to comprehensively investigate the mechanism of conversion of these films into silica ceramics via controlled-atmosphere pyrolysis. The aim of these studies is to better understand the impact of preparation conditions on the structure and properties of the resulting ceramic films. The experiments are coupled with complementary molecular simulations of the pyrolysis process that employ a reactive force field (ReaxFF). This has allowed better understanding, at the molecular level, of the processes that take place during the conversion, via pyrolysis, of the pV4D4 polymer into a silica ceramic.
登录
查看更多内容
DOI:
--
发表时间:
2022
期刊:
39th Annual International Pittsburgh Coal Conference, 2022
影响因子:
--
作者:
Mohammad Bazmi;T. Tsotsis;K. Jessen;R. Ciora;D. Parsley
通讯作者:
D. Parsley
DOI:
--
发表时间:
1997
期刊:
影响因子:
--
作者:
T. Fujii;T. Yokoi;M. Hiramatsu;M. Nawata;M. Hori;T. Goto;S. Hattori
通讯作者:
S. Hattori
DOI:
10.1111/j.1151-2916.1990.tb06499.x
发表时间:
1990-02-01
影响因子:
3.9
作者:
CARLSSON, DJ;COONEY, JD;WORSFOLD, DJ
通讯作者:
WORSFOLD, DJ
影响因子:
5
作者:
Dominique Abessolo Ondo;François Loyer;F. Werner;R. Leturcq;P. Dale;N. Boscher
通讯作者:
N. Boscher
影响因子:
3.4
作者:
K. Nomura;R. Kalia;A. Nakano;P. Rajak;P. Vashishta
通讯作者:
P. Vashishta