In vitro evaluation of the risk of inducing bacterial resistance to disinfection treatment with photolysis of hydrogen peroxide.
In vitro evaluation of the risk of inducing bacterial resistance to disinfection treatment with photolysis of hydrogen peroxide.
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DOI：
10.1371/journal.pone.0081316
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发表时间：
2013
期刊：
影响因子：
3.7
通讯作者：
Niwano Y
中科院分区：
文献类型：
--
作者：
Ikai H;Odashima Y;Kanno T;Nakamura K;Shirato M;Sasaki K;Niwano Y
本研究的目的是评估过氧化氢光解消毒处理诱导细菌耐药的风险，并将其与现有的抗菌剂进行比较。我们测试了七种抗菌剂，包括阿莫西林、盐酸头孢吡肟、红霉素、氧氟沙星、盐酸克林霉素、盐酸环丙沙星和盐酸米诺环素，作为验证检测方案的阳性对照。对于所有测试的抗菌剂，通过将四种细菌（金黄色葡萄球菌、粪肠球菌、大肠杆菌和唾液链球菌）反复暴露于亚抑制浓度的抗菌剂多达10次，至少有一种细菌对这些抗菌剂产生耐药性。相比之下，对所测试的任何细菌种类（金黄色葡萄球菌、粪肠球菌、大肠杆菌、唾液链球菌、铜绿假单胞菌、变形链球菌和伴放线聚集杆菌）的抗菌活性，在反复暴露于消毒处理多达40次时不受影响。这一发现表明消毒处理诱导细菌耐药的风险较低。这种消毒处理的活性成分是过氧化氢光解产生的羟基自由基。因此，羟基自由基与微生物细胞中的几种细胞结构和不同代谢途径相互作用，可能导致细菌不会产生耐药性。总之，就诱导细菌耐药的风险较低而言，过氧化氢光解消毒处理似乎是现有抗菌剂的一种潜在替代方法。
The purpose of the present study was to evaluate the risk of inducing bacterial resistance to disinfection treatment with photolysis of H2O2 and comparing this with existing antibacterial agents. We tested seven antibacterial agents, including amoxicillin, cefepime hydrochloride, erythromycin, ofloxacin, clindamycin hydrochloride, ciprofloxacin hydrochloride, and minocycline hydrochloride, as positive controls for validation of the assay protocol. For all of the agents tested, at least one of the four bacterial species (Staphylococcus aureus, Enterococcus faecalis, Escherichia coli, and Streptococcus salivarius) was resistant to these agents by repeated exposure to subinhibitory concentrations of the agents up to 10 times. In contrast, antibacterial activity against any of the bacterial species tested (S. aureus, E. faecalis, E. coli, S. salivarius, Pseudomonas aeruginosa, Streptococcus mutans, and Aggregatibacter actinomycetemcomitans) was not affected by repeated exposure to the disinfection treatment up to 40 times. This finding suggested that the risk of inducing bacterial resistance by disinfection treatment was low. The active ingredient of this disinfection treatment is hydroxyl radicals generated by photolysis of H2O2. Therefore, hydroxyl radicals interact with several cell structures and different metabolic pathways in microbial cells, probably resulting in a lack of development of bacterial resistance. In conclusion, disinfection treatment with photolysis of H2O2 appears to be a potential alternative for existing antimicrobial agents in terms of a low risk of inducing bacterial resistance.
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影响因子：
4
作者：
Nakamura, Keisuke;Kanno, Taro;Kohno, Masahiro
通讯作者：
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影响因子：
5.2
作者：
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通讯作者：
WATANAKUNAKORN, C
影响因子：
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影响因子：
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通讯作者：
Roncucci, Gabrio
影响因子：
4.9
作者：
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通讯作者：
Kohno, Masahiro