Stitching interferometry for ellipsoidal x-ray mirrors.
Stitching interferometry for ellipsoidal x-ray mirrors.
复制标题
椭球 X 射线镜的拼接干涉测量。
DOI：
10.1063/1.4950714
复制
发表时间：
2016
期刊：
影响因子：
--
通讯作者：
H. Ohashi
中科院分区：
文献类型：
--
作者：
H. Yumoto;T. Koyama;S. Matsuyama;K. Yamauchi;H. Ohashi
Ellipsoidal mirrors, which can efficiently produce a two-dimensional focusing beam with a single mirror, are superior x-ray focusing optics, especially when compared to elliptical-cylinder mirrors in the Kirkpatrick-Baez geometry. However, nano-focusing ellipsoidal mirrors are not commonly used for x-ray optics because achieving the accuracy required for the surface metrology of nano-focusing ellipsoidal mirrors is difficult due to their small radius of curvature along the short ellipsoidal axis. Here, we developed a surface metrology system for nano-focusing ellipsoidal mirrors using stitching interferometric techniques. The developed system simultaneously measures sub-aperture shapes with a microscopic interferometer and the tilt angles of the sub-aperture shapes with a large Fizeau interferometer. After correcting the systematic errors included in the sub-aperture shapes, the entire mirror shape is calculated by stitching the sub-aperture shapes based on the obtained relative angles between partially overlapped sub-apertures. In this study, we developed correction methods for systematic errors in sub-aperture shapes that originated from off-axis aberrations produced in the optics of the microscopic interferometer. The systematic errors on an ellipsoidal mirror were estimated by measuring a series of tilted plane substrates and the ellipsoidal substrate. From measurements of an ellipsoidal mirror with a 3.6-mm radius of curvature at the mirror center, we obtained a measurement repeatability of 0.51 nm (root-mean-square) in an assessment area of 0.5 mm × 99.18 mm. This value satisfies the requirements for surface metrology of nano-focusing x-ray mirrors. Thus, the developed metrology system should be applicable for fabricating nano-focusing ellipsoidal mirrors.
影响因子：
19.6
作者：
Mimura, Hidekazu;Handa, Soichiro;Yamauchi, Kazuto
通讯作者：
Yamauchi, Kazuto
用于陡弯曲 X 射线镜的拼接干涉测量
DOI：
--
发表时间：
2008
期刊：
Surface and Interface Analysis (In press)
影响因子：
--
作者：
H.;Yumoto;et. al.
通讯作者：
et. al.