Electrochemical deposition of nanosemiconductor CuSe on multiwalled carbon nanotubes/polyimide membrane and photoelectric property researches
Electrochemical deposition of nanosemiconductor CuSe on multiwalled carbon nanotubes/polyimide membrane and photoelectric property researches
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多壁碳纳米管/聚酰亚胺膜上纳米半导体CuSe的电化学沉积及光电性能研究
DOI:
10.1007/s10008-012-1748-x
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发表时间:
2012-04
影响因子:
2.5
通讯作者:
Wang, Chunming
中科院分区:
文献类型:
--
作者:
Li, Jiajia;Kou, Huanhuan;Jiang, Yimin;Lu, Daban;Zheng, Zhixiang;Wang, Chunming
Nanosemiconductor CuSe were prepared on self-made multiwalled carbon nanotubes/polyimide (COOH-MWCNTs/PI) membrane electrode by electrochemical atomic layer deposition (EC-ALD). By exploring the elements, electrochemical properties through cyclic voltammetry and differential pulse-stripping voltammetry, -0.2 and -0.55 V are finally identified as the deposition potential of copper and selenium, respectively. Current density − time curve obtained via amperometricI–tprocesses indicates the formation of copper layer by a two-dimensional nucleation and growth mechanism, while selenium growth is considered to be diffusion control process. X-ray powder diffraction data reveals the preferred orientation of the CuSe crystal is at (112) plane. Field emission scanning electron microscopy and energy-dispersive X-ray spectroscopy analysis show that the obtained CuSe thin film are short virgate nanostructure, and the average atomic percentage of Cu:Se is close to one. Furthermore, the ultraviolet visible (UV–Vis) transmission measurements provide a band gap of 2.0 eV. Open-circuit potential (OCP) and amperometricI–texperiments illustrate the CuSe thin film to be p-type semiconductor. Obtained results indicate that the CuSe thin film depositing on COOH-CNTs/PI membrane is appropriate to serve as the solar energy transfer material.
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影响因子:
6.6
作者:
Huanhuan Kou;Xin Zhang;Yimin Jiang;Jiajia Li;Shengjiao Yu;Zhixiang Zheng;Chunming Wang
通讯作者:
Chunming Wang
影响因子:
2.5
作者:
Y. Yang;Shengshui Hu
通讯作者:
Y. Yang;Shengshui Hu
影响因子:
1.6
作者:
G. B. Abdullaev;Z. A. Aliyarova;G. A. Asadov
通讯作者:
G. B. Abdullaev;Z. A. Aliyarova;G. A. Asadov
影响因子:
6.1
作者:
A. Tonejc;Z. Ogorelec;B. Mestnik
通讯作者:
A. Tonejc;Z. Ogorelec;B. Mestnik
影响因子:
1.8
作者:
M. Mathe;S. Cox;B. H. Flowers;R. Vaidyanathan;L. Pham;Nattapong Srisook;U. Happek;J. Stickney
通讯作者:
M. Mathe;S. Cox;B. H. Flowers;R. Vaidyanathan;L. Pham;Nattapong Srisook;U. Happek;J. Stickney