Microstructure and hemocompatibility of neodymium doped zinc oxide thin films

Microstructure and hemocompatibility of neodymium doped zinc oxide thin films
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掺钕氧化锌薄膜的微观结构和血液相容性

DOI:
10.1016/j.matlet.2011.05.031
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发表时间:
2011-08
期刊:
影响因子:
3
通讯作者:
Chen, D. H.
Chen, D. H.
中科院分区:
材料科学3区
文献类型:
--
作者:
Huang, Z. Y.;Luo, P.;Chen, M.;Pan, S. R.;Chen, D. H.

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通过射频磁控溅射,在Si(100)衬底上生长了未掺杂和掺钕的ZnO薄膜。x射线衍射谱证实了膜的微观结构具有优先的c轴生长取向。ZnO晶的晶粒尺寸随Nd浓度的增加而减小。研究表明,在ZnO薄膜中适当掺杂Nd可以改善其血液相容性。通过对样品表面能和界面张力的计算,以及对润湿性、蛋白质吸附和血小板粘附的实验验证了这一结论。
By the radio frequency magnetron sputtering, both un-doped and neodymium (Nd) doped ZnO thin films were grown on Si (100) substrates. The microstructure of the films has preferred c-axis growth orientation confirmed by the X-ray diffraction spectra. The crystallite size of ZnO crystallite decreases with the increasing of Nd concentration. We show that the hemocompatibility can be improved by a suitable Nd doping in the ZnO thin films. It is verified by both calculations on surface energy and interfacial tension of the sample, and experiments on the wettability, the proteins adsorption, and the platelets adhesion.
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