Strategic photosafety screening system consisting of in chemico photoreactivity and in vitro skin exposure for quinolone derivatives.
Strategic photosafety screening system consisting of in chemico photoreactivity and in vitro skin exposure for quinolone derivatives.
复制标题
战略性光安全筛选系统,包括喹诺酮衍生物的化学光反应性和体外皮肤暴露。
DOI:
10.1016/j.ejps.2020.105257
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发表时间:
2020
期刊:
影响因子:
--
通讯作者:
Onoue S
中科院分区:
文献类型:
--
作者:
Iyama Y;Sato H;Seto Y;Onoue S
The main objective of this study was to verify the applicable domain of a proposed photosafety screening system, consisting of a reactive oxygen species (ROS) assay andin vitroskin permeation test, for dermally-applied chemicals. Quinolones (QNLs) were selected as test compounds, including enoxacin, flumequine, moxifloxacin, nalidixic acid, orbifloxacin, and oxolinic acid. The ROS assay andin vitroskin permeation test were employed to evaluate photoreactivity and skin deposition of QNLs, respectively. All QNLs exhibited significant ROS generation on exposure to simulated sunlight; in particular, enoxacin was indicative of potent photoreactivity compared with the other 5 QNLs. Steady-state concentration values of flumequine and nalidixic acid were calculated to be 5.0 and 8.2 μg/mL, respectively, and higher than those of the other QNLs. Based on the photoreactivity and skin exposure of QNLs, the phototoxic risk was ranked, and the predicted phototoxic risk by the proposed system was mostly in agreement with observedin vivophototoxicity, suggesting the applicability of the proposed strategy to photosafety assessment of QNLs. The proposed screening would be efficacious to predict phototoxic risk of dermally-applied chemicals.
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影响因子:
3.4
作者:
PIERARD, GE;PIERARDFRANCHIMONT, C
通讯作者:
PIERARDFRANCHIMONT, C
影响因子:
5.4
作者:
Fadli Mohd;H. Todo;M. Yoshimoto;Eddy Yusuf;K. Sugibayashi
通讯作者:
K. Sugibayashi
影响因子:
3.5
作者:
Yoshiki Seto;Hiroto Ohtake;Masashi Kato;S. Onoue
通讯作者:
S. Onoue
DOI:
10.1254/jjp.62.245
发表时间:
1993
期刊:
Japanese journal of pharmacology
影响因子:
--
作者:
T. Nose;K. Tsurumi
通讯作者:
K. Tsurumi
DOI:
--
发表时间:
1986
期刊:
Photo-dermatology
影响因子:
--
作者:
W. Westerhof;B. V. van Hasselt;A. Kammeijer
通讯作者:
A. Kammeijer