Potential Protecting Group Strategy for Disila Analogues of Vinyllithiums: Synthesis and Reactivity of a 2,4,6-Trimethoxyphenyl-Substituted Disilene
Potential Protecting Group Strategy for Disila Analogues of Vinyllithiums: Synthesis and Reactivity of a 2,4,6-Trimethoxyphenyl-Substituted Disilene
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乙烯基锂的 Disila 类似物的潜在保护基策略:2,4,6-三甲氧基苯基取代的二硅烯的合成和反应性
DOI:
10.1021/om400545w
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发表时间:
2013
期刊:
影响因子:
2.8
通讯作者:
D. Scheschkewitz
中科院分区:
文献类型:
--
作者:
A. Meltzer;M. Majumdar;A. J. P. White;V. Huch;D. Scheschkewitz
Proof of concept for the protection of the nucleophilic functionality of disilenidesdisila analogues of vinyllithiumwith preservation of the SiSi bond is reported. 1-Iodo-2,4,6-trimethoxybenzene (TMOP-I) reacts with lithium tris(2,4,6-triisopropylphenyl)disilenide (1), affording the disilene Tip2SiSi(Tip)TMOP (2) in high yield. The presence of the TMOP group in disilene2enables the regioselective addition of polar substrates to the SiSi double bond, including water, ammonia, acetylenes, and isocyanides. NMR spectroscopic analysis of the reductive cleavage of the TMOP group and subsequent trapping of the corresponding disilenides with Me3SiCl reveals KC8as a highly appropriate reducing agent for the selective deprotection.
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影响因子:
56.9
作者:
WEST, R;FINK, MJ;MICHL, J
通讯作者:
MICHL, J
DOI:
--
发表时间:
1998
期刊:
影响因子:
--
作者:
T. Iwamoto;H. Sakurai;M. Kira
通讯作者:
M. Kira
影响因子:
15
作者:
T. Iwamoto;Maiko Kobayashi;K. Uchiyama;S. Sasaki;S. Nagendran;H. Isobe;M. Kira
通讯作者:
T. Iwamoto;Maiko Kobayashi;K. Uchiyama;S. Sasaki;S. Nagendran;H. Isobe;M. Kira
影响因子:
15
作者:
T. Nguyen;D. Scheschkewitz
通讯作者:
D. Scheschkewitz
DOI:
--
发表时间:
1987
期刊:
影响因子:
--
作者:
H. Yokelson;A. Millevolte;K. Haller;R. West
通讯作者:
R. West