Ultrastructural Study on Induced Resistance of Cucumber Plants against Sphaerotheca fuliginea by Oligochitosan
Ultrastructural Study on Induced Resistance of Cucumber Plants against Sphaerotheca fuliginea by Oligochitosan
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壳寡糖诱导黄瓜植株抗白粉病的超微结构研究
DOI：
10.5423/ppj.2011.27.1.008
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发表时间：
2011-03
影响因子：
2.3
通讯作者：
Hui Sun
中科院分区：
文献类型：
--
作者：
Xiao-Ming Zhao;Qing Ma;Hong-Sheng Shang;Hui Sun
采用透射电镜研究了低聚壳聚糖处理黄瓜叶片对黄瓜白粉病的诱导抗性。结果表明，经低聚壳聚糖处理和接种菌攻毒后，病害明显减少。处理后叶片菌丝发育明显受到抑制。白粉病菌丝细胞质聚集，细胞器解体，细胞质塌陷。吸器中的原生质变得电子密集。吸器畸形，细胞器解体，吸器壁增厚，最终整个吸器复合体坏死。宿主细胞产生与感染和超敏反应相关的防御结构和物质。寄主细胞壁增厚，染色深；细胞壁下有多层乳头结构；细胞壁与质膜之间有暗色物质沉积；吸器外质膜深度染色，吸器外基质表面有大量电子致密物质沉积；细胞质紊乱，寄主细胞器解体，最终整个寄主细胞解体坏死。
The induced resistance of cucumber leaves treated with oligochitosan to the infection of the cucumber powdery mildew, Sphaerotheca fuliginea, was investigated using transmission electron microscopy. The results showed that when the plants were treated with oligochitosan and challenged with inoculum, a significant decrease of the disease occurred. The mycelial development in the treated leaves was markedly inhibited. The cytoplasm of the powdery mildew mycelium was aggregated, with its organelles disintegrated and the cytoplasm collapsed. The protoplasm in haustoria became electron-dense. Haustoria became malformed, their organelles disintegrated, the hausterial wall thickened and eventually the whole complex necrotized. The host cells produced defence structures and materials associated with infection and a hypersensitive response. The host cell wall was thickened and deeply stained; several layers of papilla structure were produced under the cell wall; dark materials were deposited between the cell wall and plasmalemma; extrahaustorial plasmalemma was deeply stained and extrahaustorial matrix appositions had large deposits of electron-dense material; the cytoplasm was disordered, host organelles disintegrated and eventually the whole host cell disintegrated and necrotized.
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影响因子：
3.2
作者：
K. Wurms;C. Labbé;N. Benhamou;R. Belanger
通讯作者：
K. Wurms;C. Labbé;N. Benhamou;R. Belanger
影响因子：
7.2
作者：
Urs Neuenschwander;B. Vernooij;L. Friedrich;S. Uknes;H. Kessmann;J. Ryals
通讯作者：
Urs Neuenschwander;B. Vernooij;L. Friedrich;S. Uknes;H. Kessmann;J. Ryals
影响因子：
3.1
作者：
Hu Zhang;Yuguang Du;Xingju Yu;Masaru Mitsutomi;Sei-ichi Aiba
通讯作者：
Hu Zhang;Yuguang Du;Xingju Yu;Masaru Mitsutomi;Sei-ichi Aiba
影响因子：
2.8
作者：
Reuveni, R;Dor, G;Tuzun, S
通讯作者：
Tuzun, S
影响因子：
2.2
作者：
Q. Ma;H. Shang
通讯作者：
Q. Ma;H. Shang