Scaling description of positive magnetoresistivity in doped dilute magnetic semiconductors
Scaling description of positive magnetoresistivity in doped dilute magnetic semiconductors
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掺杂稀磁半导体中正磁阻的缩放描述
DOI:
10.1016/j.jmmm.2014.11.069
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发表时间:
2015
影响因子:
2.7
通讯作者:
S. D. Baranovskii
中科院分区:
文献类型:
--
作者:
A. V. Nenashev; F. Jansson;S. Petznick;M. Wiemer;P.J. Klar;A. V. Dvurechenskii;F. Gebhard;S. D. Baranovskii
The effect of a large positive magnetoresistance (MR) in Zn 1− x Mn x Se: Cl materials in the hopping regime is studied experimentally and theoretically. A possible mechanism of this effect has been recently suggested [Nenashev et al., Phys. Rev. B 88 (2013) 115210][4] based on the increase of energy disorder in the distribution of dopant levels caused by the exchange interaction between magnetic Mn atoms and the electrons localized on nonmagnetic Cl impurities. In the current work we confirm this mechanism experimentally by comparison between the MR in samples with finite Mn content x and the MR in a sample with x= 0. At x= 0, a negative MR is observed, while at finite x a large positive MR is evidenced with the dependence on magnetic field similar to that of the macroscopic magnetization, confirming the suggested MR mechanism at finite x. Scaling description of the positive MR [Nenashev et al., Phys. Rev. B 88 (2013) 115210][4] has been suggested so far only for the case of the nearest-neighbor-hopping or Mott variable-range-hopping regimes. In the current work, we present experimental data to analyze the underlying transport regime and extend the scaling description for the Efros–Shklovskii variable-range-hopping regime, in which many-particle Coulomb interactions play a decisive role for the distribution of electron energies on dopant atoms.
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DOI:
--
发表时间:
2010
期刊:
影响因子:
--
作者:
V. Kytin;V. A. Kul’bachinskiĭ;D. Glebov;L. Burova;A. Kaul;O. V. Reukova
通讯作者:
O. V. Reukova
DOI:
--
发表时间:
2006
期刊:
影响因子:
--
作者:
K. C. Agarwal;B. Daniel;C. Klingshirn;M. Hetterich
通讯作者:
M. Hetterich
DOI:
--
发表时间:
2005
期刊:
影响因子:
--
作者:
B. Daniel;K. C. Agarwal;J. Lupaca;C. Klingshirn;M. Hetterich
通讯作者:
M. Hetterich
DOI:
--
发表时间:
2003
期刊:
影响因子:
--
作者:
W. Heimbrodt;P. Klar
通讯作者:
P. Klar
影响因子:
3.2
作者:
F. Jansson;M. Wiemer;A. Nenashev;S. Petznick;P. Klar;M. Hetterich;F. Gebhard;S. Baranovskii
通讯作者:
F. Jansson;M. Wiemer;A. Nenashev;S. Petznick;P. Klar;M. Hetterich;F. Gebhard;S. Baranovskii