Unified design of wavelength-independent deep-etched fused-silica gratings

Unified design of wavelength-independent deep-etched fused-silica gratings
复制标题

与波长无关的深蚀刻熔融石英光栅的统一设计

DOI:
10.1016/j.optcom.2010.06.041
复制
发表时间:
2010-11
影响因子:
2.4
通讯作者:
Zhou, Changhe
Zhou, Changhe
中科院分区:
物理与天体物理3区
文献类型:
--
作者:
Feng, Jijun;Lu, Peng;Cao, Hongchao;Zhou, Changhe

文献摘要

参考文献

被引文献

相似文献

采用简化模态方法,统一设计了波长无关的深蚀刻熔融石英光栅偏振分束器和偏振无关的双端口分束器。通过将统一光栅参数定义为入射波长与光栅周期之比和槽深与光栅周期之比,得到统一光栅结构近似与波长无关,这是基于两种受激传播光栅模式累积相位差的模态视图。严格耦合波分析(RCWA)给出的衍射效率验证了1064nm波长的统一设计。需要注意的是,这种与波长无关的光栅的统一设计是一个解析结果,这是不可能用众所周知的数值RCWA推导出来的。模态法功能强大,为我们获得统一的设计提供了清晰的物理画面。因此,这种统一的设计可以作为设计深蚀刻熔融硅光栅作为分束器的一般准则,用于从紫外到近红外的实际应用。
We present a unified design of wavelength-independent deep-etched fused-silica gratings as polarizing beam splitters and polarization-independent two-port beam splitters by using the simplified modal method. By defining unified grating parameters as the ratio of incident wavelength to grating period and the ratio of groove depth to grating period, unified grating structures are found to be approximately wavelength-independent, which is based on the modal view of the accumulated phase difference of two excited propagating grating modes. Diffraction efficiencies given by the rigorous coupled-wave analysis (RCWA) verified this unified design at the wavelength of 1064nm. It should be noted that this unified design of wavelength-independent gratings is an analytic result, which is impossible to be derived with the well-known numerical RCWA. Modal method is powerful and presents a clear physical picture for us to obtain this unified design. Therefore, this unified design can be used as a general guideline for designing deep-etched fused-silica gratings as beam splitters for practical applications from ultraviolet to near infrared.
DOI: 10.1364/ao.44.004429
发表时间: 2005-07
期刊: Applied optics
影响因子: 1.9
作者:
Shunquan Wang;Changhe Zhou;H. Ru;Yanyan Zhang
通讯作者: Shunquan Wang;Changhe Zhou;H. Ru;Yanyan Zhang
DOI: 10.1364/ao.44.003143
发表时间: 2005-06-01
期刊: APPLIED OPTICS
影响因子: 1.9
作者:
Néauport, J;Journot, E;Bouchut, P
通讯作者: Bouchut, P
DOI: 10.1364/ao.42.006934
发表时间: 2003-12-01
期刊: APPLIED OPTICS
影响因子: 1.9
作者:
Clausnitzer, T;Limpert, J;Ristau, D
通讯作者: Ristau, D
DOI: 10.1364/ol.32.001299
发表时间: 2007-05
期刊: Optics letters
影响因子: 3.6
作者:
Bo Wang;Changhe Zhou;Shunquan Wang;Jijun Feng
通讯作者: Bo Wang;Changhe Zhou;Shunquan Wang;Jijun Feng
DOI: 10.1364/oic.2004.tha5
发表时间: 2004-06
期刊: Optics letters
影响因子: 3.6
作者:
J. Kim;J. Birge;V. Sharma;J. Fujimoto;E. X. Kärtner;V. Scheuer;G. Angelow
通讯作者: J. Kim;J. Birge;V. Sharma;J. Fujimoto;E. X. Kärtner;V. Scheuer;G. Angelow