Thermal stability of tungsten sub-nitride thin film prepared by reactive magnetron sputtering
Thermal stability of tungsten sub-nitride thin film prepared by reactive magnetron sputtering
复制标题
反应磁控溅射制备低氮化钨薄膜的热稳定性
DOI:
10.1016/j.jnucmat.2016.12.009
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发表时间:
2017-03
影响因子:
3.1
通讯作者:
P. Wang
中科院分区:
文献类型:
--
作者:
X.X. Zhang;Y.Z. Wu;B. Mu;L. Qiao;W.X. Li;J.J. Li;P. Wang
Tungsten sub-nitride thin films deposited on silicon samples by reactive magnetron sputtering were used as a model system to study the phase stability and microstructural evolution during thermal treatments. XRD, SEM&FIB, XPS, RBS and TDS were applied to investigate the stability of tungsten nitride films after heating up to 1473 K in vacuum. At the given experimental parameters a 920 nm thick crystalline film with a tungsten and nitrogen stoichiometry of 2:1 were achieved. The results showed that no phase and microstructure change occurred due to W2N film annealing in vacuum up to 973 K. Heating up to 1073 K led to a partial decomposition of the W2N phase and the formation of a W enrichment layer at the surface. Increasing the annealing time at the same temperature, the further decomposition of the W2N phase was negligible. The complete decomposition of W2N film happened as the temperature reached up to 1473 K.
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影响因子:
2.3
作者:
Shingubara, Shoso;Liu, Zonghuai;Wang, Zenglin;Yang, Zupei
通讯作者:
Yang, Zupei
影响因子:
3.3
作者:
A. Kallenbach;R. Dux;M. Mayer;R. Neu;T. Pütterich;V. Bobkov;J. Fuchs;T. Eich;L. Giannone
通讯作者:
A. Kallenbach;R. Dux;M. Mayer;R. Neu;T. Pütterich;V. Bobkov;J. Fuchs;T. Eich;L. Giannone
影响因子:
3.1
作者:
Brezinsek, S.
通讯作者:
Brezinsek, S.
DOI:
10.1116/1.1498278
发表时间:
2002-09-01
期刊:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS
影响因子:
--
作者:
Baker, CC;Shah, SI
通讯作者:
Shah, SI
影响因子:
2.2
作者:
R. Neu;M. Balden;V. Bobkov;R. Dux;O. Gruber;A. Herrmann;A. Kallenbach;M. Kaufmann;C. Maggi
通讯作者:
R. Neu;M. Balden;V. Bobkov;R. Dux;O. Gruber;A. Herrmann;A. Kallenbach;M. Kaufmann;C. Maggi