Improved oxidation resistance of SPS sintered Si2BC3N ceramics with disilicides (MoSi2, HfSi2, TaSi2) addition
Improved oxidation resistance of SPS sintered Si2BC3N ceramics with disilicides (MoSi2, HfSi2, TaSi2) addition
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添加二硅化物(MoSi2、HfSi2、TaSi2)提高 SPS 烧结 Si2BC3N 陶瓷的抗氧化性
DOI:
10.1016/j.ceramint.2020.04.127
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发表时间:
2020-04
影响因子:
5.2
通讯作者:
Jung In-Ho
中科院分区:
文献类型:
--
作者:
Liao Ning;Ji Zixu;Yang Zhihua;Jia Dechang;Li Yawei;Jung In-Ho
Although Si2BC3N ceramics have excellent oxidation resistance under high temperature (1000–1400 °C) in both dry and moist air, the oxidation resistance under higher temperatures (above 1400 °C) are still challenged due to the quick escape of volatile CO, B2O3and SiO. Generally, the formation of stable and continuous protective layer is critical for improving the oxidation resistance under high temperature. Given the chemical compatibility and the formation of nonvolatile oxides after oxidation, the present work mainly investigated the influences of disilicides addition, including MoSi2, HfSi2and TaSi2, on the phase composition and oxidation resistance of Si2BC3N ceramics sintered by SPS. The results showed that nano sized disilicides would transform into carbides (MoC, Mo5Si3, and TaC) and oxides (TaO, HfO2) during sintering process. The preferential oxidation of Mo and Hf related phases and the formation of much stable oxidation layer could improve the oxidation resistance significantly, where the oxidation layer thickness was less than 10 μm after testing at 1600 °C for 3 h.
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影响因子:
5.2
作者:
Zhang Pengfei;Yang Bin;Lu Zhi;Jia Dechang
通讯作者:
Jia Dechang
影响因子:
8.3
作者:
Daxin Li;Zhihua Yang;D. Jia;Shengjin Wang;X. Duan;Qishuai Zhu;Yang Miao;J. Rao;Yu Zhou
通讯作者:
Daxin Li;Zhihua Yang;D. Jia;Shengjin Wang;X. Duan;Qishuai Zhu;Yang Miao;J. Rao;Yu Zhou
影响因子:
5.2
作者:
Daxin Li;Zhihua Yang;D. Jia;Daoxiong Wu;Qishuai Zhu;B. Liang;Shengjin Wang;Yu Zhou
通讯作者:
Daxin Li;Zhihua Yang;D. Jia;Daoxiong Wu;Qishuai Zhu;B. Liang;Shengjin Wang;Yu Zhou
DOI:
10.1016/s0921-5093(99)00593-6
发表时间:
2000-02
影响因子:
6.4
作者:
X. Fan;K. Hack;T. Ishigaki
通讯作者:
X. Fan;K. Hack;T. Ishigaki
影响因子:
5.7
作者:
Z. Hao;Wei Sun;X. Xiong;Z. Chen;Yalei Wang;Yabin Chang;Yonglong Xu
通讯作者:
Z. Hao;Wei Sun;X. Xiong;Z. Chen;Yalei Wang;Yabin Chang;Yonglong Xu