Researches on uniformity of diamond-like carbon films deposited on inner surface of long and slender quartz glass tube by enhanced glow discharge plasma immersion ion implantation and deposition
Researches on uniformity of diamond-like carbon films deposited on inner surface of long and slender quartz glass tube by enhanced glow discharge plasma immersion ion implantation and deposition
复制标题
增强辉光放电等离子体浸没离子注入沉积在细长石英玻璃管内表面沉积类金刚石碳膜的均匀性研究
DOI：
10.1016/j.surfcoat.2015.08.056
复制
发表时间：
2015-10
影响因子：
5.4
通讯作者：
Zhao, J. Q.
中科院分区：
文献类型：
--
作者：
Li, L. H.;Luo, J.;Jing, K.;Zhao, J. Q.
增强辉光放电等离子体浸没离子注入和沉积（EGD-PIII&D）已成功地用于在内径小至0.9 mm且纵横比超过100的石英玻璃管的内表面上沉积类金刚石碳（DLC）。而均匀性是内表面沉积类金刚石薄膜的关键问题。通过改变乙炔流量和负电压，研究了气体流量和负电压对石英玻璃管内壁沉积类金刚石薄膜均匀性的影响。利用电子-中性粒子碰撞频率νe定性分析了DLC膜的均匀化机理。结果表明，通过平衡气体流量和负电压可以获得均匀的DLC膜。
Enhanced glow discharge plasma immersion ion implantation and deposition (EGD-PIII&D) has been successfully used for depositing diamond-like carbon (DLC) on the inner surface of the quartz glass tube with an inner diameter as small as 0.9 mm and aspect ratios of over 100. And the uniformity is a key problem for the DLC films deposited on the inner surface. By changing the C2H2flow rate and negative voltage, the effects of the gas flow rate and voltage on the uniformity of the DLC films deposited on the inner surface of the quartz glass tube are experimentally examined. The electron-neutral collision frequency, νe, is used to qualitatively analyze the mechanism of uniformizing DLC films. The results reveal that uniform DLC films may be obtained by balancing both the gas flow rate and the negative voltage.
登录
查看更多内容
带材拉拔凹模上沉积的 DLC 薄膜的摩擦学行为
影响因子：
6.3
作者：
C.J. Wang, B. Guo, D.B. Shan, X.M. Bai
通讯作者：
C.J. Wang, B. Guo, D.B. Shan, X.M. Bai
DOI：
10.1016/j.nimb.2010.03.026
发表时间：
2010-07
影响因子：
1.3
作者：
W. Ariyasinghe;G. Vilela
通讯作者：
W. Ariyasinghe;G. Vilela
影响因子：
4.1
作者：
X. D. Yang;T. Saito;Y. Nakamura;Y. Kondo;N. Ohtake
通讯作者：
X. D. Yang;T. Saito;Y. Nakamura;Y. Kondo;N. Ohtake
影响因子：
6.7
作者：
K. Baba;R. Hatada;S. Flege;W. Ensinger
通讯作者：
K. Baba;R. Hatada;S. Flege;W. Ensinger
影响因子：
6.3
作者：
V. Vahedi;M. Surendra
通讯作者：
V. Vahedi;M. Surendra