Cobalt-assisted recrystallization and alignment of pure and doped graphene.

Cobalt-assisted recrystallization and alignment of pure and doped graphene.
复制标题

纯石墨烯和掺杂石墨烯的钴辅助再结晶和排列

DOI:
10.1039/c8nr03183e
复制
发表时间:
2018
期刊:
影响因子:
6.7
通讯作者:
D.V. Vyalikh
D.V. Vyalikh
中科院分区:
材料科学2区
文献类型:
--
作者:
D. Yu. Usachov;K.A. Bokai;D.E. Marchenko;A.V. Fedorov;V.O. Shevelev;O. Yu. Vilkov;E.Yu. Kataev;L.V. Yashina;E. Rühl;C. Laubschat;D.V. Vyalikh

文献摘要

参考文献

被引文献

相似文献

散装物料的再结晶是一种众所周知的现象,广泛应用于商业生产中。然而,对于像石墨烯这样的低维材料,这一过程仍然是一个悬而未决的难题。因此,了解低维重结晶的基本机制和所需条件对于制定廉价和可靠生产高质量纳米材料的路线至关重要。在这里,我们揭示了在Co(0001)表面上的一个原子厚的纯的和硼掺杂的多晶石墨烯层的有效再结晶的细节。通过应用光电子能谱和电子衍射,我们展示了超过90%的初始错误取向的石墨烯颗粒可以重建成一个良好的取向和单晶层。所获得的重结晶的石墨烯/Co界面表现出高的结构质量,具有明显的亚晶格不对称性,这对于实现石墨烯的不平衡亚晶格掺杂是重要的。通过探索天然和B掺杂的石墨烯在Co上的再结晶动力学,我们能够估计活化能并提出该过程的机制。
Recrystallization of bulk materials is a well-known phenomenon, which is widely used in commercial manufacturing. However, for low-dimensional materials like graphene, this process still remains an unresolved puzzle. Thus, the understanding of the underlying mechanisms and the required conditions for recrystallization in low dimensions is essential for the elaboration of routes towards the inexpensive and reliable production of high-quality nanomaterials. Here, we unveil the details of the efficient recrystallization of one-atom-thick pure and boron-doped polycrystalline graphene layers on a Co(0001) surface. By applying photoemission and electron diffraction, we show how more than 90% of the initially misoriented graphene grains can be reconstructed into a well-oriented and single-crystalline layer. The obtained recrystallized graphene/Co interface exhibits high structural quality with a pronounced sublattice asymmetry, which is important for achieving an unbalanced sublattice doping of graphene. By exploring the kinetics of recrystallization for native and B-doped graphene on Co, we were able to estimate the activation energy and propose a mechanism of this process.
DOI: 10.1103/physrevb.94.085431
发表时间: 2016-08-31
期刊: PHYSICAL REVIEW B
影响因子: 3.7
作者:
Stoehr, Alexander;Forti, Stiven;Benia, Hadj M.
通讯作者: Benia, Hadj M.
碳在固体钴中的扩散
DOI: --
发表时间: 1992
期刊:
影响因子: --
作者:
R. Mclellan;C. Ko;M. Wasz
通讯作者: M. Wasz
DOI: 10.1021/acs.nanolett.6b01795
发表时间: 2016-06
期刊: Nano letters
影响因子: 10.8
作者:
D. Usachov;A. Fedorov;O. Vilkov;A. Petukhov;A. Rybkin;A. Ernst;M. Otrokov;E. Chulkov;I. Ogorodnikov;M. Kuznetsov;L. Yashina;E. Kataev;A. V. Erofeevskaya;V. Voroshnin;V. K. Adamchuk;C. Laubschat;D. Vyalikh
通讯作者: D. Usachov;A. Fedorov;O. Vilkov;A. Petukhov;A. Rybkin;A. Ernst;M. Otrokov;E. Chulkov;I. Ogorodnikov;M. Kuznetsov;L. Yashina;E. Kataev;A. V. Erofeevskaya;V. Voroshnin;V. K. Adamchuk;C. Laubschat;D. Vyalikh
DOI: 10.1021/nn402927q
发表时间: 2013-09-01
期刊: ACS NANO
影响因子: 17.1
作者:
Patera, Laerte L.;Africh, Cristina;Cepek, Cinzia
通讯作者: Cepek, Cinzia
DOI: 10.1021/nl300985q
发表时间: 2012-08-01
期刊: NANO LETTERS
影响因子: 10.8
作者:
Zan, Recep;Ramasse, Quentin M.;Novoselov, Konstantin S.
通讯作者: Novoselov, Konstantin S.