Homogeneous surface oxidation and triangle patterning of monolayer MoS2 by hydrogen peroxide
Homogeneous surface oxidation and triangle patterning of monolayer MoS2 by hydrogen peroxide
复制标题
过氧化氢对单层 MoS2 的均匀表面氧化和三角形图案化
DOI:
10.1016/j.apsusc.2018.05.025
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发表时间:
2018-09
影响因子:
6.7
通讯作者:
Zhen Liang
中科院分区:
文献类型:
--
作者:
Xu Cheng-Yan;Qin Jing-Kai;Yan Hang;Li Yang;Shao Wen-Zhu;Zhen Liang
Atomically thin monolayer molybdenum disulfides (MoS2) with tunable electronic structure has promising applications in opto-electronic devices and sensors. In this work, unique nano-patterning and surface oxidation of monolayer MoS2was achieved based on hydrogen peroxide (H2O2) treatment. It was found that the exfoliated monolayer MoS2can be uniformly oxidized when exposed to low-concentration H2O2, forming an intermediate phase composed of MoSxOy. In addition, patterned triangular pits with well-defined edges can be formed under high-concentration H2O2condition. The band gap of monolayer MoS2could be effectively modulated by H2O2treatment as verified by photoluminescence spectra. This work shows that simple H2O2treatment can be an alternative approach for both surface functionalization and band gap modulation of MoS2flake, and it also provides an alternatively simple way to obtain patterned MoS2nanostructures without complicated standard lithography processes.
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