Homogeneous surface oxidation and triangle patterning of monolayer MoS2 by hydrogen peroxide

Homogeneous surface oxidation and triangle patterning of monolayer MoS2 by hydrogen peroxide
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过氧化氢对单层 MoS2 的均匀表面氧化和三角形图案化

DOI:
10.1016/j.apsusc.2018.05.025
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发表时间:
2018-09
影响因子:
6.7
通讯作者:
Zhen Liang
Zhen Liang
中科院分区:
材料科学1区
文献类型:
--
作者:
Xu Cheng-Yan;Qin Jing-Kai;Yan Hang;Li Yang;Shao Wen-Zhu;Zhen Liang

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具有可调电子结构的原子薄单层二硫化钼(MoS2)在光电子器件和传感器中具有广阔的应用前景。在这项工作中,独特的纳米图案化和表面氧化的单层二硫化钼(H2O2)处理的基础上实现。结果表明,在低浓度H_2O_2中,MoS_2被均匀氧化,形成由MoS_xO_y组成的中间相.此外,在高浓度H2O2条件下,可以形成具有良好边界的图案化三角形凹坑。光致发光谱表明,H2O2处理可以有效地调节单层MoS2的禁带宽度。本工作表明,简单的H2O2处理可以作为MoS2薄片表面功能化和带隙调制的替代方法,并且它也提供了一种替代的简单方法来获得图案化的MoS2纳米结构,而无需复杂的标准光刻工艺。
Atomically thin monolayer molybdenum disulfides (MoS2) with tunable electronic structure has promising applications in opto-electronic devices and sensors. In this work, unique nano-patterning and surface oxidation of monolayer MoS2was achieved based on hydrogen peroxide (H2O2) treatment. It was found that the exfoliated monolayer MoS2can be uniformly oxidized when exposed to low-concentration H2O2, forming an intermediate phase composed of MoSxOy. In addition, patterned triangular pits with well-defined edges can be formed under high-concentration H2O2condition. The band gap of monolayer MoS2could be effectively modulated by H2O2treatment as verified by photoluminescence spectra. This work shows that simple H2O2treatment can be an alternative approach for both surface functionalization and band gap modulation of MoS2flake, and it also provides an alternatively simple way to obtain patterned MoS2nanostructures without complicated standard lithography processes.
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