Multi-channel micro neural probe fabricated with SOI
Multi-channel micro neural probe fabricated with SOI
复制标题
SOI制造的多通道微型神经探针
DOI：
10.1007/s11431-008-0272-9
复制
发表时间：
2009-05
期刊：
影响因子：
--
通讯作者：
Chen HongDa
中科院分区：
文献类型：
--
作者：
Zhang Xu;Pei WeiHua;Lu Lin;Gao ShangKai;Zhu Lin;Tang Jun;Wang ShuJing;Guo Kai;Chen HongDa
绝缘体上硅（SOI）衬底广泛应用于微机电系统（MEMS）中。利用SOI的埋置氧化层作为蚀刻止点，可以制备出均匀性和可加工性较好的硅基微神经探针。采用电感耦合等离子体（ICP）对SOI衬底进行干刻蚀，形成了7记录位点的神经探针。探头厚度为15 μm。探头轴的尺寸为3 mm×100 μm×15 μm，记录部位的典型面积为78.5 μm2。体外测定记录部位的阻抗。记录点的典型阻抗特性在1 kHz时约为2 MΩ。在麻醉大鼠身上测试了神经探针的活体性能。记录到的神经峰值一般在140 μV左右。单个位点的峰值可超过700 μV。平均信噪比大于等于7。
Silicon-on-insulator (SOI) substrate is widely used in micro-electro-mechanical systems (MEMS). With the buried oxide layer of SOI acting as an etching stop, silicon based micro neural probe can be fabricated with improved uniformity and manufacturability. A seven-record-site neural probe was formed by inductive-coupled plasma (ICP) dry etching of an SOI substrate. The thickness of the probe is 15 μm. The shaft of the probe has dimensions of 3 mm×100 μm×15 μm with typical area of the record site of 78.5 μm2. The impedance of the record site was measuredin-vitro. The typical impedance characteristics of the record sites are around 2 MΩ at 1 kHz. The performance of the neural probe in-vivo was tested on anesthetic rat. The recorded neural spike was typically around 140 μV. Spike from individual site could exceed 700 μV. The average signal noise ratio was 7 or more.
登录
查看更多内容
影响因子：
22.7
作者：
McFarland DJ;Wolpaw JR
通讯作者：
Wolpaw JR
影响因子：
64.8
作者：
Wessberg, J;Stambaugh, CR;Nicolelis, MAL
通讯作者：
Nicolelis, MAL
影响因子：
2.3
作者：
Norlin, P;Kindlundh, M;Hofmann, UG
通讯作者：
Hofmann, UG
影响因子：
64.8
作者：
C. Tomlinson
通讯作者：
C. Tomlinson
DOI：
10.1109/iembs.2003.1279833
发表时间：
2003-09
期刊：
Proceedings of the 25th Annual International Conference of the IEEE Engineering in Medicine and Biology Society (IEEE Cat. No.03CH37439)
影响因子：
--
作者：
R. Olsson;D. Buhl;M. Gulari;G. Buzsáki;K. Wise
通讯作者：
R. Olsson;D. Buhl;M. Gulari;G. Buzsáki;K. Wise